Stress-induced selective nano-crystallization in laser-processed amorphous Fe-Si-B alloys

Philosophical Magazine Letters

Volumn 92, Issue 11, 2012, Pages 617-624

  Katakam, Shravana ^a   Santhanakrishnan, S ^a   Vora, Hitesh ^a   Hwang, Jun Y ^a   Banerjee, Rajarshi ^a   Dahotre, Narendra B ^a  

^a UNIVERSITY OF NORTH TEXAS   (United States)

Author keywords

crystallization; laser processing; metallic glass; nano crystallization; thermal stress

Indexed keywords

ACTIVATION BARRIERS; FE-SI-B; LASER PROCESS; LASER TRACKS; MICRO-STRUCTURAL CHARACTERIZATION; STRESS-INDUCED; THERMAL MODEL;

AMORPHOUS ALLOYS; CERIUM ALLOYS; CRYSTALLIZATION; METALLIC GLASS; NANOCRYSTALLIZATION; SILICON; SILICON ALLOYS; THERMAL STRESS;

AMORPHOUS SILICON;

EID: 84867478919     PISSN: 09500839     EISSN: 13623036     Source Type: Journal    
DOI: 10.1080/09500839.2012.704416     Document Type: Article

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