TiO2 and Al2O3 ultra thin nanolaminates growth by ALD; instrument automation and films characterization

Revista Mexicana de Fisica

Volumn 58, Issue 6, 2012, Pages 459-465

  Tiznado, H ^a   Dominguez D ^a   de la Cruz, W ^a   Machorro, R ^a   Curiel, M ^a   Soto, G ^a  

^a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

Author keywords

Atomic layer deposition; Automation; Ellipsometry; Instrumentation; Nanolaminates

Indexed keywords

EID: 84867471767     PISSN: 0035001X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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