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Volumn 25, Issue 1, 2012, Pages 91-93

Electrodeposition of Cu-Rh alloys and their use as cathodes for nitrate reduction

Author keywords

Alloy plating; Copper; Electrocatalysis; Metastable alloys; Rhodium

Indexed keywords

ALLOY PLATING; DEPOSITED ALLOY; DEPOSITION POTENTIAL; EDS ANALYSIS; METASTABLE ALLOY; MISCIBILITY GAP; NITRATE REDUCTION; POLYCRYSTALLINE; REDUCTION PEAK; SULFATE SOLUTIONS; XRD ANALYSIS;

EID: 84867236186     PISSN: 13882481     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elecom.2012.09.026     Document Type: Article
Times cited : (68)

References (17)
  • 14
    • 84868198476 scopus 로고    scopus 로고
    • ICDD Card 04-0836, (1953)
    • ICDD Card 04-0836, (1953).
  • 15
    • 84868207259 scopus 로고    scopus 로고
    • ICDD Card 05-0685, (1976)
    • ICDD Card 05-0685, (1976).
  • 17
    • 0001819307 scopus 로고
    • A.J. Bard, Marcel Dekker New York
    • R. Woods A.J. Bard, Electroanalytical Chemistry Vol.9 1976 Marcel Dekker New York 1 162
    • (1976) Electroanalytical Chemistry , vol.9 , pp. 1-162
    • Woods, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.