Single etch grating couplers for mass fabrication with DUV lithography

Optical and Quantum Electronics

Volumn 44, Issue 12-13, 2012, Pages 521-526

  Halir, R ^a   Zavargo Peche, L ^a   Xu, D X ^b   Cheben, P ^b   Ma, R ^b   Schmid, J H ^b   Janz, S ^b   Densmore, A ^b   Ortega Monux A ^a   Molina Fernandez I ^a   Fournier, M ^c   Fedeli J M ^c  

^a UNIVERSITY OF MÁLAGA   (Spain)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

^c CEA LETI   (France)

Author keywords

Deep ultraviolet lithography; Fiber to chip grating coupler; Single etch process

Indexed keywords

COUPLING EFFICIENCY; DEEP ULTRAVIOLET LITHOGRAPHY; DUV LITHOGRAPHY; EFFICIENT COUPLING; GRATING COUPLERS; GRATING DESIGN; MASS FABRICATION; PATTERN FIDELITY; PROCESS VARIATION; SILICON ON INSULATOR WAVEGUIDE; SINGLE ETCH; SUB-WAVELENGTH; SURFACE GRATING; ULTRA-VIOLET;

NANOPHOTONICS; OPTICAL FIBER COUPLING; OPTICAL FIBER FABRICATION; PHOTONICS;

LITHOGRAPHY;

EID: 84867234272     PISSN: 03068919     EISSN: 1572817X     Source Type: Journal    
DOI: 10.1007/s11082-012-9563-2     Document Type: Article

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