Tuning the growth mechanism of ZnO nanowires by controlled carrier and reaction gas modulation in thermal CVD

Journal of Physical Chemistry Letters

Volumn 3, Issue 19, 2012, Pages 2815-2821

  Menzel, Andreas ^a   Subannajui, Kittitat ^a,b   Bakhda, Rakshit ^a   Wang, Yabin ^a   Thomann, Ralf ^a   Zacharias, Margit ^a  

^a UNIVERSITY OF FREIBURG   (Germany)

^b MAHIDOL UNIVERSITY   (Thailand)

Author keywords

[No Author keywords available]

Indexed keywords

CARBOTHERMAL REDUCTION METHOD; CONTROLLED GROWTH; CVD REACTORS; DEPOSITION TECHNIQUE; FILM FORMATIONS; GROWTH MECHANISMS; MAIN PARAMETERS; PARAMETER RANGE; REACTION GAS; SCHEMATIC REPRESENTATIONS; SUBSTRATE TEMPERATURE; SYSTEMATIC EXPERIMENT; THERMAL CVD; VAPOR-SOLID; VAPOR-SOLID GROWTH; ZNO NANOWIRES;

CARBOTHERMAL REDUCTION; CATALYSTS; CHEMICAL VAPOR DEPOSITION; NANOWIRES; VAPORS; ZINC OXIDE;

FILM GROWTH;

EID: 84867169423     PISSN: None     EISSN: 19487185     Source Type: Journal    
DOI: 10.1021/jz301103s     Document Type: Review

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