Mesoporous metal nitride materials prepared from bulk oxides

Journal of the American Ceramic Society

Volumn 95, Issue 10, 2012, Pages 3084-3089

  Yang, Minghui ^a   MacLeod, Michelle J ^a   Tessier, Franck ^b   Disalvo, Francis J ^a  

^a Department of Molecular Biology and Genetics   (United States)

^b UNIVERSITÉ DE RENNES 1   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONOLYSIS; BULK OXIDES; ELECTRICAL CONDUCTIVITY; HIGH SINTERING TEMPERATURES; HIGH SURFACE AREA; MESOPOROUS; MESOPOROUS METAL; MESOSCALE; METAL NITRIDES; NANOPATTERNING; NITROGEN ADSORPTION; POWDER X-RAY DIFFRACTION (PXRD); PROCESSING CONDITION; TEMPLATING; TERNARY OXIDES; TRANSITION METAL NITRIDES;

ELECTRIC CONDUCTIVITY; MOLYBDENUM OXIDE; RIETVELD REFINEMENT; SCANNING ELECTRON MICROSCOPY; SINTERING; STOICHIOMETRY; TANTALUM COMPOUNDS; TIN OXIDES; TITANIUM NITRIDE; TRANSITION METALS; X RAY DIFFRACTION;

MESOPOROUS MATERIALS;

EID: 84867049959     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2012.05351.x     Document Type: Article

References (27)

1. F. J. DiSalvo, and, S. J. Clarke, " Ternary Nitrides: A Rapidly Growing Class of new Materials," Curr. Opin. Solid State Mater. Sci., 1, 241-9 (1996).
2. F. J. DiSalvo, and, R. Niewa, " Recent Developments in Nitride Chemistry," Chem. Mater., 10, 2733-52 (1998).
3. 2-x Perovskites," J. Am. Chem. Soc., 132, 4822-9 (2010).
4. A. Fuertes, " Synthesis and Properties of Functional Oxynitrides-From Photocatalysts to CMR Materials," Dalton Trans., 39, 5942-8 (2010).
5. R. Marchand, Y. Laurent, J. Guyader, P. L'Haridon, and, P. Verdier, " Nitrides and Oxynitrides: Preparation, Crystal Chemistry and Properties," J. Eur. Ceram. Soc., 8, 197-213 (1991).
6. 2N and Comparison With Oxide Perovskites," Chem. Mater., 14, 288-94 (2002).
7. 2 Evolution by Ru on TaON Photocatalyst Under Visible Light Irradiation," Chem. Commun., 24, 3000-1 (2003).
8. A. Gomathi, " Ternary Metal Nitrides by the Urea Route," Mater. Res. Bull., 42, 870-4 (2007).
9. A. Gomathi, A. Sundaresan, and, C. N. R. Rao, " Nanoparticles of Superconducting β-Mo2N and β-MoN," J. Solid State Chem., 180, 291-5 (2007).
10. A. Fischer, J. O. Müller, M. Antonietti, and, A. Thomas, " Synthesis of Ternary Metal Nitride Nanoparticles Using Mesoporous Carbon Nitride as Reactive Template," ACS Nano, 2, 2489-96 (2008).
11. F. S. Bates, and, G. H. Fredrickson, " Block Copolymers-Designer Soft Materials," Phys. Today, 52, 32-8 (1999).
12. H. Hsueh, Y. Huang, R. Ho, C. Lai, T. Makida, and, H. Hasegawa, " Nanoporous Gyroid Nickel From Block Copolymer Templates via Electroless Plating," Adv. Mater., 23, 3041-6 (2011).
13. J. Erlebacher, M. J. Aziz, A. Karma, N. Dimitrov, and, K. Sieradzki, " Evolution of Nanoporosity in Dealloying," Nature, 410, 450-3 (2001).
14. 2 Films Through Benard-Marangoni Convection," Mater. Res. Innovations, 5, 178-84 (2002).
15. E. S. Toberer, M. Grossman, T. Schladt, F. F. Lange, and, R. Seshadri, " Epitaxial Manganese Oxide Thin Films With Connected Porosity: Topotactic Induction of Crystallographic Pore Alignment," Chem. Mater., 19, 4833-8 (2007).
16. A.C. Larson, and, R. B. Von Dreele, " General Structure Analysis System (GSAS) "; Los Alamos National Laboratory Report LAUR 86-748 1994, http://www.ccp14.ac.uk/solution/gsas/.
17. W. Gruner, B. Wollein, and, W. Lengauer, " Elemental Analysis," Microchim. Acta, 146, 1 (2004).
18. 5 at 16 K by Time-of-Flight Neutron Diffraction," Acta Crystallogr., Sect. C, 47, 2291-4 (1991).
19. A. N. Christensen, " A Neutron Diffraction Investigation of Single Crystals of Titanium Carbide, Titanium Nitride, and Zirconium Nitride," Acta Chem. Scand., 29, 563-8 (1975).
20. 5 and TaON," Metall. Trans., 3, 489-93 (1972).
21. Y. Du, A. L. Ji, L. B. Ma, Y. Q. Wang, and, Z. X. Cao, " Electrical Conductivity and Photo Reflectance of Nanocrystalline Copper Nitride Thin Films Deposited at low Temperature," J. Cryst. Growth, 280, 490-4 (2005).
22. R. Y. Petrykina, and, L. K. Shvedova, " Hot Pressing of Transition Metal Nitrides and Their Properties," Powder Metall. Met. Ceram., 11, 276-9 (1972).
23. J. S. Becker, and, R. G. Gordon, " Diffusion Barrier Properties of Tungsten Nitride Films Grown by Atomic Layer Deposition From bis(Tert-Butylimido)bis(Dimethylamido)Tungsten and Ammonia," Appl. Phys. Lett., 82, 2239-41 (2003).
24. D. K. Schroder, Semiconductor Material and Device Characterization. (3rd ed.), Wiley-Interscience, Hoboken, NJ, 2006.
25. D. V. Pugh, A. Dursun, and, S. G. Corcoran, " Electrochemical and Morphological Characterization of Pt-Cu Dealloying," J. Electrochem. Soc., 152, B455-9 (2005).
26. M. Stratmann, and, M. Rohwerder, " A Pore View of Corrosion," Nature, 410, 420-1 (2001).
27. J. Rugolo, J. Erlebacher, and, K. Sieradzki, " Length Scales in Alloy Dissolution and Measurement of Absolute Interfacial Free Energy," Nat. Mater., 5, 946-9 (2006).