Polarization dependence and surface sensitivity of linear and nonlinear photoemission from Bi/Cu(111)

Physical Review B - Condensed Matter and Materials Physics

Volumn 86, Issue 12, 2012, Pages

  Anal, A Akin ^a   Winkelmann, Aimo ^a   Tusche, Christian ^a   Bisio, Francesco ^b   Ellguth, Martin ^a   Chiang, Cheng Tien ^a   Henk, Jürgen ^c   Kirschner, Jürgen ^a  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^b CNR SPIN   (Italy)

^c MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84866984477     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.86.125447     Document Type: Article

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