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Volumn , Issue , 2012, Pages 19-20
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A new Metal Control Gate Last process (MCGL process) for high performance DC-SF (Dual Control gate with Surrounding Floating gate) 3D NAND flash memory
a a a a a a a a a a a a a a a a a a a a more.. |
Author keywords
[No Author keywords available]
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Indexed keywords
CONTACT HOLES;
CONTROL GATES;
DUAL CONTROL;
FLOATING GATES;
HIGH RELIABILITY;
LOW DAMAGES;
NAND FLASH MEMORY;
TUNNEL OXIDES;
NAND CIRCUITS;
THREE DIMENSIONAL COMPUTER GRAPHICS;
TUNGSTEN;
PROCESS CONTROL;
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EID: 84866533021
PISSN: 07431562
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/VLSIT.2012.6242440 Document Type: Conference Paper |
Times cited : (20)
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References (5)
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