Hierarchical porous gold electrodes: Preparation, characterization, and electrochemical behavior

Journal of Electroanalytical Chemistry

Volumn 684, Issue , 2012, Pages 53-59

  Zhao, Bo ^a   Collinson, Maryanne M ^a  

^a VIRGINIA COMMONWEALTH UNIVERSITY   (United States)

Author keywords

Electrodeposition; Ferrocene derivatives; Hierarchical; Macroporous gold; Raspberry like templates; Templating

Indexed keywords

ACETONE; CYCLIC VOLTAMMETRY; ELECTRODEPOSITION; GOLD; IRON COMPOUNDS; LATEXES; METHANOL; ORGANOMETALLICS; PHOTOELECTRONS; POLYSTYRENES; SCANNING ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

FERROCENE DERIVATIVE; HIERARCHICAL; MACROPOROUS; RASPBERRY-LIKE TEMPLATES; TEMPLATING;

ELECTROCHEMICAL ELECTRODES;

EID: 84866533003     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2012.08.025     Document Type: Article

References (41)

1. T. Asefa, C.T. Duncan, and K.K. Sharma Analyst 134 2009 1980 1990
2. Y.G. Guo, J.S. Hu, and L.J. Wan Advanced Materials 20 2008 2878 2887
3. A. Walcarius Analytical and Bioanalytical Chemistry 396 2010 261 272
4. A. Wittstock, J. Biener, and M. Baumer Physical Chemistry Chemical Physics 12 2010 12919 12930
5. A. Walcarius, and A. Kuhn TrAC-Trends in Analytical Chemistry 27 2008 593 603
6. J.H. Bae, J.H. Han, and T.D. Chung Physical Chemistry Chemical Physics 14 2012 448 463
7. J. Liu, and D.F. Xue Nanoscale Research Letters 5 2010 1525 1534
8. P.N. Bartlett, J.J. Baumberg, P.R. Birkin, M.A. Ghanem, and M.C. Netti Chemistry of Materials 14 2002 2199 2208
9. R. Szamocki, S. Reculusa, S. Ravaine, P.N. Bartlett, A. Kuhn, and R. Hempelmann Angewandte Chemie - International Edition 45 2006 1317 1321
10. R. Szamocki, A. Velichko, C. Holzapfel, F. Mucklich, S. Ravaine, P. Garrigue, N. Sojic, R. Hempelmann, and A. Kuhn Analytical Chemistry 79 2007 533 539
11. C.H. Wang, C. Yang, Y.Y. Song, W. Gao, and X.H. Xia Advanced Functional Materials 15 2005 1267 1275
12. Y. Ding, and J. Erlebacher Journal of the American Chemical Society 125 2003 7772 7773
13. O.V. Shulga, K. Jefferson, A.R. Khan, V.T. D'Souza, J.Y. Liu, A.V. Demchenko, and K.J. Stine Chemistry of Materials 19 2007 3902 3911
14. P.N. Ciesielski, A.M. Scott, C.J. Faulkner, B.J. Berron, D.E. Cliffel, and G.K. Jennings ACS Nano 2 2008 2465 2472
15. S. Cattarin, D. Kramer, A. Lui, and M.M. Musiani Journal of Physical Chemistry C 111 2007 12643 12649
16. F.L. Jia, C.F. Yu, Z.H. Ai, and L.Z. Zhang Chemistry of Materials 19 2007 3648 3653
17. W. Huang, M.H. Wang, J.F. Zheng, and Z.L. Li Journal of Physical Chemistry C 113 2009 1800 1805
18. C. Shin, W. Shin, and H.G. Hong Electrochimica Acta 53 2007 720 728
19. F. Schroper, D. Bruggemann, Y. Mourzina, B. Wolfrum, A. Offenhausser, and D. Mayer Electrochimica Acta 53 2008 6265 6272
20. Z.H. Li, V. Ravaine, S. Ravaine, P. Garrigue, and A. Kuhn Advanced Functional Materials 17 2007 618 622
21. S. Marx, M.V. Jose, J.D. Andersen, and A.J. Russell Biosensors & Bioelectronics 26 2011 2981 2986
22. X.Y. Xiao, G.A. Montano, T.L. Edwards, C.M. Washburn, S.M. Brozik, D.R. Wheeler, D.B. Burckel, and R. Polsky Biosensors & Bioelectronics 26 2011 3641 3646
23. M.A.S. Chong, Y.B. Zheng, H. Gao, and L.K. Tan Applied Physics Letters 89 2006
24. M.E. Cox, and D.C. Dunand Materials Science and Engineering A - Structural Materials Properties Microstructure and Processing 528 2011 2401 2406
25. G.T. Duan, W.P. Cai, Y.Y. Luo, F.J. Lv, J.L. Yang, and Y. Li Langmuir 25 2009 2558 2562
26. B.J. Plowman, A.P. O'Mullane, P.R. Selvakannan, and S.K. Bhargava Chemical Communications 46 2010 9182 9184
27. B. Zhao, and M.M. Collinson Chemistry of Materials 22 2010 4312 4319
28. L.M. Fischer, M. Tenje, A.R. Heiskanen, N. Masuda, J. Castillo, A. Bentien, J. Emneus, M.H. Jakobsen, and A. Boisen Microelectronic Engineering 86 2009 1282 1285
29. A. Stein, F. Li, and N.R. Denny Chemistry of Materials 20 2008 649 666
30. Y. Wang, A.S. Angelatos, and F. Caruso Chemistry of Materials 20 2008 848 858
31. A.J. Bard, and L.R. Faulkner Electrochemical Methods: Fundamentals and Applications 1980 John Wiley & Sons, Inc. New York
32. J.H. Han, E. Lee, S. Park, R. Chang, and T.D. Chung Journal of Physical Chemistry C 114 2010 9546 9553
33. S. Park, Y.J. Song, J.H. Han, H. Boo, and T.D. Chung Electrochimica Acta 55 2010 2029 2035
34. L.Y.S. Lee, T.C. Sutherland, S. Rucareanu, and R.B. Lennox Langmuir 22 2006 4438 4444
35. C.E.D. Chidsey, C.R. Bertozzi, T.M. Putvinski, and A.M. Mujsce Journal of the American Chemical Society 112 1990 4301 4306
36. M.M. Walczak, D.D. Popenoe, R.S. Deinhammer, B.D. Lamp, C.K. Chung, and M.D. Porter Langmuir 7 1991 2687 2693
37. D. Nkosi, J. Pillay, K.I. Ozoemena, K. Nouneh, and M. Oyama Physical Chemistry Chemical Physics 12 2010 604 613
38. G.K. Rowe, and S.E. Creager Langmuir 7 1991 2307 2312
39. K. Uosaki, Y. Sato, and H. Kita Langmuir 7 1991 1510 1514
40. K.W. Willman, R.D. Rocklin, R. Nowak, K.N. Kuo, F.A. Schultz, and R.W. Murray Journal of the American Chemical Society 102 1980 7629 7634
41. A. Merz, and A.J. Bard Journal of the American Chemical Society 100 1978 3222 3223