High performance bulk planar 20nm CMOS technology for low power mobile applications

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 2012, Pages 129-130

  Shang, Huiling ^a   Jain, S ^a   Josse, E ^a   Alptekin, E ^a   Nam, M H ^a   Kim, S W ^a   Cho, K H ^a   Kim, I ^a   Liu, Y ^a   Yang, X ^a   Wu, X ^a   Ciavatti, J ^a   Kim, N S ^a   Vega, R ^a   Kang, L ^a   Meer, H V ^a   Samavedam, S ^a   Celik, M ^a   Soss, S ^a   Utomo, H ^a   Ramachandran, R ^a   Lai, W ^a   Sardesai, V ^a   Tran, C ^a   Kim, J Y ^a   Park, Y H ^a   Tan, W L ^a   Shimizu, T ^a   Joy, R ^a   Strane, J ^a   Tabakman, K ^a   Lalanne, F ^a   Montanini, P ^a   Babich, K ^a   Kim, J B ^a   Economikos, L ^a   Cote, W ^a   Reddy, C ^a   Belyansky, M ^a   Arndt, R ^a   Kwon, U ^a   Wong, K ^a   Koli, D ^a   Levedakis, D ^a   Lee, J W ^a   Muncy, J ^a   Krishnan, S ^a   Schepis, D ^a   Chen, X ^a   Kim, B D ^a   Tian, C ^a   Linder, B P ^a   Cartier, E ^a   Narayanan, V ^a   Northrop, G ^a   Menut, O ^a   Meiring, J ^a   Thomas, A ^a   Aminpur, M ^a   Park, S H ^a   Lee, K Y ^a   Kim, B Y ^a   Rhee, S H ^a   Hamieh, B ^a   Srivastava, R ^a   Koshy, R ^a   Goldberg, C ^a   Pallachalil, M ^a   Chae, M ^a   Ogino, A ^a   Watanabe, T ^a   Oh, M ^a   Mallela, H ^a   Codi, D ^a   Malinge, P ^a   Weybright, M ^a   Mann, R ^a   Mittal, A ^a   Eller, M ^a   Lian, S ^a   Li, Y ^a   Divakaruni, R ^a   Bukofsky, S ^a   Kim, J D ^a   Sudijono, J ^a   Neumueller, W ^a   Matsuoka, F ^a   Sampson, R ^a   more..

^a IBM RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BULK TECHNOLOGIES; CMOS TECHNOLOGY; CO-OPTIMIZATION; COMPUTING APPLICATIONS; DENSITY SCALING; DRIVE CURRENTS; HIGH DENSITY WIRING; LOW POWER; LOW POWER TECHNOLOGIES; METAL GATE; MOBILE APPLICATIONS; STANDBY POWER; STATIC NOISE MARGIN; STRAIN ENGINEERING;

CMOS INTEGRATED CIRCUITS; DIELECTRIC MATERIALS; GATE DIELECTRICS;

TECHNOLOGY;

EID: 84866526221     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/VLSIT.2012.6242495     Document Type: Conference Paper

References (7)

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5. M. Hamaguchi et al., IEDM, pp 579-582, 2011;
6. Tomizawa et al., IITC 2011;
7. C.K. Hu et al, AMC 2011.