Replacement metal gate extendible to 11 nm technology

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 2012, Pages 81-82

  Yoshida, Naomi ^a   Fu, Xinyu ^a   Xu, Kun ^a   Lei, Yu ^a   Yang, Haichun ^a   Sun, Shiyu ^a   Chen, Hao ^a   Darlak, Andrew ^a   Donohoe, Ray ^a   Lazik, Christopher ^a   Jakkaraju, Rajkumar ^a   Noori, Atif ^a   Hung, Steven ^a   Peidous, Igor ^a   Chang, Chorng Ping ^a   Brand, Adam ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COAL ALLOYS; METAL FILL; METAL GATE;

ALUMINUM;

EID: 84866525442     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/VLSIT.2012.6242471     Document Type: Conference Paper

References (7)

1. K. Mistry et al., IEDM 2007
2. P. Packan et al., IEDM 2009
3. K. Kuhn et al., IWJT 2010
4. K. Ohmori et al., VLSI 2009
5. H. Michaelson, J. A. P. 1977
6. K. Xu et al., IMRC 2011
7. IIT Thermal Processing Technology Center, phase diagram data base