Reaction CH 3 + OH studied over the 294-714 K temperature and 1-100 bar pressure ranges

Journal of Physical Chemistry A

Volumn 116, Issue 34, 2012, Pages 8661-8670

  Sangwan, Manuvesh ^a   Chesnokov, Evgeni N ^b   Krasnoperov, Lev N ^a  

^a NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^b INSTITUTE OF CHEMICAL KINETICS AND COMBUSTION   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ABSOLUTE INTENSITY; BATH GAS; DC DISCHARGES; HYDROXYL RADICALS; IN-SITU; LOW PRESSURES; METHYL RADICAL; NEGATIVE TEMPERATURES; OH RADICAL; OXYGEN ATOM; OZONE FORMATION; PHOTOLYSIS LIGHT; PRESSURE AND TEMPERATURE; PRESSURE RANGES; PULSED LASER PHOTOLYSIS; TEMPORAL PROFILE; TRANSIENT ABSORPTION; UV-VIS ABSORPTION SPECTROSCOPY; XENON ARC LAMPS;

ACETONE; FREE RADICALS; LASERS; OZONE; RATE CONSTANTS; ULTRAVIOLET SPECTROSCOPY;

PHOTOLYSIS;

EID: 84865693965     PISSN: 10895639     EISSN: 15205215     Source Type: Journal    
DOI: 10.1021/jp305070c     Document Type: Article

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