Humido-responsive nanostructures prepared by nanoimprinting

Microelectronic Engineering

Volumn 98, Issue , 2012, Pages 634-637

  Ye, Mengmeng ^a   Li, Jin Xing ^a   Li, Jianying ^a   Li, Weiming ^a   Lu, Bing Rui ^a   Huang, Gaoshan ^a   Mei, Yongfeng ^a   Chen, Yifang ^b   Liu, Ran ^a  

^a FUDAN UNIVERSITY   (China)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

Humido responsive polymer; Nanoimprinting; PAA PVA polymeric film; Shape deformation

Indexed keywords

DOT ARRAY; EXTERNAL STIMULATION; GRATING STRUCTURES; NANO-IMPRINTING; OPTICAL DETECTION; PIEZOELECTRIC DETECTION; POLY(VINYL ALCOHOL) (PVA); POLYACRYLIC ACIDS; POLYMERIC STRUCTURES; POTENTIAL APPLICATIONS; RAPID RESPONSE; SHAPE DEFORMATION; SLIT WIDTH; TRENCH DEPTH;

CARBOXYLIC ACIDS; DEFORMATION; FERROELECTRIC MATERIALS; MOISTURE; NANOIMPRINT LITHOGRAPHY; NANOSTRUCTURES;

DIFFRACTION GRATINGS;

EID: 84865604089     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2012.07.069     Document Type: Conference Paper

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