Electrodeposition of selenium from 1-ethyl-3-methylimidazolium trifluromethylsulfonate

Journal of Solid State Electrochemistry

Volumn 16, Issue 9, 2012, Pages 3027-3036

  Abdel Aal, A ^a,b,c   Voigts, F ^a   Chakarov, D ^b   Endres, F ^a  

^a CLAUSTHAL UNIVERSITY OF TECHNOLOGY   (Germany)

^b CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

^c CENTRAL METALLURGICAL RESEARCH AND DEVELOPMENT INSTITUTE CMRDI   (Egypt)

Author keywords

Electrodeposition; Ionic liquids; Selenium; Thin films

Indexed keywords

ABSORBANCES; BATH TEMPERATURES; COPPER SUBSTRATES; DEPOSITED FILMS; ELEVATED TEMPERATURE; GOLD SUBSTRATES; HEXAGONAL STRUCTURES; IMIDAZOLIUM; MONOCLINIC PHASE; RHOMBOHEDRAL STRUCTURES; ROOM TEMPERATURE; SURFACE CONTAMINATIONS;

AMORPHOUS FILMS; COPPER; CYCLIC VOLTAMMETRY; ELECTRODEPOSITION; GOLD; GOLD DEPOSITS; IONIC LIQUIDS; PHOTOELECTRON SPECTROSCOPY; SELENIUM; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

SEMICONDUCTING SELENIUM COMPOUNDS;

EID: 84865516728     PISSN: 14328488     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10008-012-1743-2     Document Type: Article

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