Effect of rf power on the properties of rf magnetron sputtered ZnO:Al thin films

Materials Chemistry and Physics

Volumn 136, Issue 1, 2012, Pages 205-209

  Saad, M ^a   Kassis, A ^a  

^a DEPARTMENT OF MOLECULAR BIOLOGY AND BIOTECHNOLOGY   (Syrian Arab Republic)

Author keywords

Al interstitials; O vacancies; Rf power; Sputtering; Thin film; ZnO:Al

Indexed keywords

AL-DOPED ZNO; AL-INTERSTITIALS; ALUMINUM-DOPED ZINC OXIDE; ELECTRICAL RESISTIVITY; FILM PROPERTIES; FILM STRUCTURE; INTERPLANAR SPACINGS; LOW PRESSURES; O-VACANCIES; RF MAGNETRONS; RF-MAGNETRON SPUTTERING; RF-POWER; RF-SPUTTERING; ROOM TEMPERATURE; ZNO; ZNO:AL THIN FILMS;

ALUMINUM; CRYSTALLITE SIZE; ELECTRIC CONDUCTIVITY; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; OPTICAL FILMS; SPUTTERING; THIN FILMS; ZINC OXIDE;

FILM PREPARATION;

EID: 84865513140     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2012.06.053     Document Type: Article

References (30)

1. S. Flickyngerova, V. Tvarozek, and P. Gaspierik Zinc oxide - a unique material for advanced photovoltaic solar cells Journal of Electrical Engineering 61 5 2010 291 295
2. D. Kim, I. Yun, and H. Kim Fabrication of rough Al doped ZnO films deposited by low pressure chemical vapor deposition for high efficiency thin film solar cells Current Applied Physics 10 2010 459 462
3. C.G. Granqvist Transparent conductors as solar energy materials: a panoramic review Solar Energy Materials & Solar Cells 91 2007 1529 1598
4. A.I. Ali, C.H. Kim, J.H. Cho, and B.G. Kim Growth and characterization of ZnO:Al thin film using rf sputtering for transparent conducting oxide Journal of the Korean Physical Society 49 2006 652 656
5. D. Song, P. Widenborg, W. Chin, and A.G. Aberle Investigation of lateral parameter variations of Al-doped zinc oxide films prepared on glass substrates by rf magnetron sputtering Solar Energy Materials & Solar Cells 73 2002 1 20
6. H. Zhang, C. Lei, H. Liu, and C. Yuan Low-temperature deposition of transparent conducting ZnO:Zr films on PET substrates by dc magnetron sputtering Applied Surface Science 255 2009 6054 6056
7. X. Hao, J. Ma, D. Zhang, T. Yang, H. Ma, Y. Yang, C. Cheng, and J. Huang Thickness dependence of structural, optical and electrical properties of ZnO:Al films prepared on flexible substrates Applied Surface Science 183 2001 137 142
8. D.H. Zhang, T.L. Yang, J. Ma, Q.P. Wang, R.W. Gao, and H.L. Ma Preparation of transparent conducting ZnO:Al films on polymer substrates by rf magnetron sputtering Applied Surface Science 158 2000 43 48
9. L.P. Peng, L. Fang, X.F. Yang, H.B. Ruan, Y.J. Li, Q.L. Huang, and C.Y. Kong Characteristics of ZnO:In thin films prepared by rf magnetron sputtering Physica E 41 2009 1819 1823
10. S.H. Jeong, and J.H. Boo Influence of target-to-substrate distance on the properties of AZO films grown by RF magnetron sputtering Thin Solid Films 447-448 2004 105 110
11. K. Ellmer, R. Cebulla, and R. Wendt Transparent and conducting ZnO:Al films deposited by simultaneous rf- and dc-excitation of a magnetron Thin Solid Films 317 1998 413 416
12. P. Scherrer Bestimmung der Größe und der inneren Struktur von Kolloidteilchen mittels Röntgenstrahlen Göttinger Nachrichten 2 1918 98 100
13. L. Li, L. Fang, X.M. Chen, J. Liu, F.F. Yang, Q.J. Li, G.B. Liu, and S.J. Feng Influence of oxygen argon ratio on the structural, electrical, optical and thermoelectrical properties of Al-doped ZnO thin films Physica E 41 2008 169 174
14. S. Lin, J. Huang, and D. Lii The effects of r.f. power and substrate temperature on the properties of ZnO films Surface and Coatings Technology 176 2004 173 181
15. Y. Lee, J. Lee, Y. Kim, H. Yang, J. Park, and H. Kim Microstructural evolution and preferred orientation change of radio-frequency-magnetron sputtered ZnO thin films Journal of Vacuum Science and Technology A 14 1996 1943 1948
16. J. Kim, H. Kim, and D. Kim Effect of RF power on an Al-doped ZnO thin film deposited by RF magnetron sputtering Journal of the Korean Physical Society 59 3 2011 2349 2353
17. S. Flickyngerova, K. Shtereva, V. Stenova, D. Hasko, I. Novotny, V. Tvarozek, P. Sutta, and E. Vavrinsky Structural and optical properties of sputtered ZnO thin films Applied Surface Science 254 2008 3643 3647
18. J. Ting, and B.S. Tsai Dc reactive sputter deposition of ZnO:Al thin film on glass Materials Chemistry and Physics 72 2001 273 277
19. L. Dghoughi, F. Ouachtari, M. Addou, B. Elidrissi, H. Erguig, A. Rmili, and A. Bouaoud The effect of Al-doping on the structural, optical, electrical and cathodoluminescence properties of ZnO thin films prepared by spray pyrolysis Physica B: Condensed Matter 405 2010 2277 2282
20. H. Zhu, E. Bunte, J. Hüpkes, H. Siekmann, and S.M. Huang Aluminum doped zinc oxide sputtered from rotatable dual magnetrons for thin film silicon solar cells Thin Solid Films 517 2009 3161 3166
21. X. Yu, J. Ma, F. Ji, Y. Wang, X. Zhang, C. Cheng, and H. Ma Effects of sputtering power on the properties of ZnO:Ga films deposited by r.f. magnetron-sputtering at low temperature Journal of Crystal Growth 274 2005 474 479
22. D.J. Kwak, M.W. Park, and Y.M. Sung Discharge power dependence of structural and electrical properties of Al-doped ZnO conducting film by magnetron sputtering (for PDP) Vacuum 83 2009 113 118
23. E. Fortunato, P. Barquinha, A. Pimentel, A. Gonçalves, A. Marques, L. Pereira, and R. Martins Recent advances in ZnO transparent thin film transistors Thin Solid Films 487 2005 205 211
24. W. Gao, and Z. Li ZnO thin films produced by magnetron sputtering Ceramics International 30 2004 1155 1159
25. E. Burstein Anomalous optical absorption limit in InSb Physical Review 93 1954 632 633
26. T.S. Moss The Interpretation of the properties of indium antimonide Proceedings of the Royal Society of London, Series B 67 1954 775 782
27. J. Tauc, R. Grigorovici, and A. Vancu Optical properties and electronic structure of amorphous germanium Physica Status Solidi B 15 1966 627 637
28. Özgür, Y.I. Alivov, C. Liu, A. Teke, M.A. Reshchikov, S. Doan, V. Avrutin, S.J. Cho, and H. Morko A comprehensive review of ZnO materials and devices Journal of Applied Physics 98 041301 2005 1 103
29. F. Urbach The long-wavelength edge of photographic sensitivity and of the electronic absorption of solids Physical Review 92 1953 1324
30. S.M. Sze Physics of Semiconductor Devices second ed. 1981 John Wiley & Sons New York p. 849