Role of plasma parameters on the conjugated structure retention in polyaniline thin film hussain

Plasma Chemistry and Plasma Processing

Volumn 32, Issue 4, 2012, Pages 817-832

  Amreen, A A ^a   Sharma, Shyamalima ^a   Pal, Arup R ^a   Bailung, Heremba ^a   Chutia, Joyanti ^a   Patil, Dinkar S ^b  

^a INSTITUTE OF ADVANCED STUDY IN SCIENCE AND TECHNOLOGY   (India)

^b BHABHA ATOMIC RESEARCH CENTRE   (India)

Author keywords

Conjugated polyaniline; Plasma diagnostics; Plasma parameters; Plasma polymerization

Indexed keywords

AROMATIC RINGS; CONJUGATED STRUCTURES; DEPOSITION TIME; DISCHARGE POWER; DOPED POLYANILINE; ELECTRON ENERGY DISTRIBUTION FUNCTIONS; FILM CHARACTERISTICS; IODINE DOPING; LANGMUIR PROBE ANALYSIS; LANGMUIR PROBE DIAGNOSTICS; PLASMA PARAMETER; PLASMA PROPERTIES; POLYANILINE THIN FILMS; PRESSURE VARIATIONS; PROCESS PLASMA; RADIO FREQUENCY PLASMA; RF DISCHARGE; SELF-BIAS;

EMISSION SPECTROSCOPY; IODINE; LANGMUIR PROBES; LIGHT EMISSION; PLASMA DEVICES; PLASMA DIAGNOSTICS; PLASMA POLYMERIZATION; PLASMAS; POLYANILINE; SEMICONDUCTOR DOPING; THIN FILMS; VAPOR DEPOSITION;

DEPOSITION;

EID: 84865486786     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-012-9381-0     Document Type: Article

References (31)

1. Umadevi G, Ponnusamy V, Paramsivam M, Palaniswamy S (2010) Rasa-yan J Chem 3:194-200
2. Nabid MR, Sedghi R, Jamaat PR, Safari N, Entezami AA (2007) Appl Catal A Gen 328:52-57
3. Sapurina I, Stejskal J (2008) Polym Int 57:1295-1325
4. Chakraborty G, Sarkar A, Ghosh P, Meikap AK, Chowdhury P (2009) Polym Eng Sci 49:910-915
5. Morales J, Olayo MG, Cruz GJ, Castillo-Ortega MM, Olayo R (2000) J Polym Sci B Polym Phys 38:3247-3255
6. Goto H (2011) Polymers 3:875-885
7. Sajeev US, Joseph Mathai CJ, Saravanan S, Ashokan Rajeev R, Venkatachalam S, Anantharaman MR (2006) Bull Mater Sci 29:159-163
8. Stakhira P, Cherpak V, Volynyuk D, Hotra Z, Belukh V, Aksimentyeva O, Tsizh B, Monastyrskyi L (2010) Rev Adv Mater Sci 23:180-184
9. Zeng X-R, Ko T-M (1997) J Polym Sci B Polym Phys 35:1993-2001
10. Totolin M, Grigoras M, Conduruta D (2007) J Optoelectron Adv Mater 9:881-883
11. Debarnot D, Mérian T, P-Epaillard F (2011) Plasma Chem Plasma Process 31:217-231
12. Sarma Bimal K, Pal AR, Bailung H, Chutia J (2011) Plasma Chem Plasma Process 31:741-754
13. Lee S-W, Seo S-H, In J-H, Chung C-W, Chang H-Y (2005) Phys Plasma 12:063502
14. Seo S-H, In J-H, Chang H-Y (2005) J Appl Phys 98:083302
15. Stoykov S, Eggs C, Kortshagen U (2001) J Phys D Appl Phys 34:2160-2173
16. Pearse RWB, Gaydon AG (1950) The identification of molecular spectra. Chapman & Hall Ltd, London
17. Olayo MG, Morales J, Cruz GJ, Olayo R, Ordoñez E, Barocio SR (2001) J Polym Sci B Polym Phys 39:175-183
18. Cruz GJ, Morales J, Castillo-Ortega MM, Olayo R (1997) Synth Met 88:213-218
19. Chandrakanthi N, Careem MA (2000) Polym Bull 45:113-120
20. Bhadra S, Singha NK, Khastgir D (2007) J Appl Polym Sci 104:1900-1904
21. Raghavendra SC, Khasim S, Revanasiddappa M, Prasad MVNA, Kulkarni AB (2003) Bull Mater Sci 26:733-739
22. Yasuda H (1985) Plasma polymerization. Academic Press, New York, p 432
23. Hegemann D, Schütz U, Körner E (2011) Plasma Process Polym 8:689-694
24. Huang WS, MacDiarmid AG (1993) Polymer 34:1833-1845
25. Kim MC, Cho SH, Han JG, Hong BY, Kim YJ, Yang SH, Boo J-H (2003) Surf Coat Technol 169-170:595-599
26. Tauc J (ed) (1974) Amorphous and liquid semiconductors. Plenum, London
27. Yakuphanoglu F, S enkal BF (2008) Polym Adv Technol 19:1876-1881
28. Yakuphanoglu F, Basaran E, S enkal BF, Sezer E (2006) J Phys Chem B 110:16908-16913
29. Lakshmi GBVS, Dhillon A, Siddiqui AM, Zulfequar M, Avasthi DK (2009) European Polym J 45:2873-2877
30. Bhadra S, Khastgir D (2009) Synth Met 159:1141-1146
31. Adhikari S, Banerji P (2010) Thin Solid Films 518:5421-5425