Kinetics of hydrogen underpotential deposition at polycrystalline platinum in acidic solutions

Electrochimica Acta

Volumn 80, Issue , 2012, Pages 292-301

  Łosiewicz, Boena ^a   Jurczakowski, Rafał ^b   Lasia, Andrzej ^c  

^a UNIVERSITY OF SILESIA   (Poland)

^b UNIVERSITY OF WARSAW   (Poland)

^c UNIVERSITÉ DE SHERBROOKE   (Canada)

Author keywords

Double layer and adsorption capacitance; High frequency electrochemical impedance spectroscopy; HUPD kinetics; Origin of frequency dispersion; Polycrystalline platinum

Indexed keywords

ACIDIC SOLUTIONS; CAPACITIVE RESPONSE; CHARGE TRANSFER RESISTANCE; CLASSICAL SET; DOUBLE LAYERS; DOUBLE-LAYER CAPACITANCE; ELECTRICAL EQUIVALENT CIRCUIT; FREQUENCY DISPERSION; FREQUENCY RANGES; FREQUENCY RESPONSE ANALYZERS; GEOMETRIC SIZES; HIGH FREQUENCY; HIGH FREQUENCY MEASUREMENTS; HYDROGEN ADSORPTION; HYDROGEN UNDER-POTENTIAL DEPOSITION; IMPEDANCE SPECTRUM; LARGE SURFACE AREA; LOW FREQUENCY; LOWER FREQUENCIES; POLYCRYSTALLINE PLATINUM; POTENTIOSTATS; PT ELECTRODE; PT-DISK; STAND-ALONE MODES; SURFACE AREA;

ADSORPTION; CHARGE TRANSFER; CYCLIC VOLTAMMETRY; DISPERSIONS; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; FREQUENCY RESPONSE; KINETICS; REACTION KINETICS; VOLTAGE REGULATORS;

PLATINUM;

EID: 84865262409     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2012.07.019     Document Type: Article

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