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Volumn 12, Issue 7, 2012, Pages 6074-6079
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Preparation of highly dispersed tungsten oxide on MCM-41 via atomic layer deposition and its application to butanol dehydration
a a b c a |
Author keywords
Atomic Layer Deposition; Butanol Dehydration; MCM 41; Tungsten Oxide
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Indexed keywords
2-BUTANOL;
ACID SITE;
LEWIS ACID SITE;
MAXIMUM LOADING;
MCM-41;
MESOPOROUS SILICA;
PHYSICOCHEMICAL PROPERTY;
TEXTURAL PROPERTIES;
TUNGSTEN OXIDE;
WEAK ACIDS;
XRD;
ALCOHOLS;
BUTENES;
CATALYSTS;
DEHYDRATION;
LOADING;
MESOPOROUS MATERIALS;
OXIDES;
TUNGSTEN COMPOUNDS;
ULTRATHIN FILMS;
ATOMIC LAYER DEPOSITION;
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EID: 84865147386
PISSN: 15334880
EISSN: 15334899
Source Type: Journal
DOI: 10.1166/jnn.2012.6290 Document Type: Article |
Times cited : (10)
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References (14)
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