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Volumn 12, Issue 7, 2012, Pages 6074-6079

Preparation of highly dispersed tungsten oxide on MCM-41 via atomic layer deposition and its application to butanol dehydration

Author keywords

Atomic Layer Deposition; Butanol Dehydration; MCM 41; Tungsten Oxide

Indexed keywords

2-BUTANOL; ACID SITE; LEWIS ACID SITE; MAXIMUM LOADING; MCM-41; MESOPOROUS SILICA; PHYSICOCHEMICAL PROPERTY; TEXTURAL PROPERTIES; TUNGSTEN OXIDE; WEAK ACIDS; XRD;

EID: 84865147386     PISSN: 15334880     EISSN: 15334899     Source Type: Journal    
DOI: 10.1166/jnn.2012.6290     Document Type: Article
Times cited : (10)

References (14)
  • 1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.