Preparation of amorphous TiS x thin film electrodes by the PLD method and their application to all-solid-state lithium secondary batteries

Journal of Materials Science

Volumn 47, Issue 18, 2012, Pages 6601-6606

  Matsuyama, Takuya ^a   Sakuda, Atsushi ^a   Hayashi, Akitoshi ^a   Togawa, Yoshihiko ^a   Mori, Shigeo ^a   Tatsumisago, Masahiro ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALL-SOLID-STATE; AR GAS PRESSURE; DEPOSITION CONDITIONS; HIGH RESOLUTION; KRF EXCIMER LASER; LASER FLUENCES; LITHIUM SECONDARY BATTERIES; MICROSCOPIC IMAGE; PERIODIC LATTICES; PULSE ENERGIES; REVERSIBLE CAPACITY; ROOM TEMPERATURE; SOLID-STATE CELLS; TARGET-SUBSTRATE DISTANCE; THIN-FILM ELECTRODE; TITANIUM SULFIDE; TRANSMISSION ELECTRON; XRD PATTERNS;

AMORPHOUS FILMS; ARGON LASERS; DEPOSITION; ELECTRODES; EXCIMER LASERS; FILM THICKNESS; KRYPTON; LITHIUM; PELLETIZING; PULSED LASER DEPOSITION; SECONDARY BATTERIES; THIN FILMS; VAPOR DEPOSITION;

FILM PREPARATION;

EID: 84864753435     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-012-6594-9     Document Type: Article

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