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Volumn , Issue , 2012, Pages 204-207
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An alternative polymeric protection mask for bulk KOH etching of silicon
a b b b |
Author keywords
[No Author keywords available]
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Indexed keywords
BULK MICROMACHINING TECHNOLOGY;
DEPTH RATIO;
ETCH DEPTH;
ETCHING CONDITION;
KOH ETCHING;
KOH SOLUTION;
LATERAL ETCHING;
MEMSDEVICES;
MICRO-CANTILEVERS;
POLYMERIC COATINGS;
PROCESS STEPS;
PROTECTIVE LAYERS;
THERMAL OXIDE LAYER;
THERMAL OXIDES;
COATINGS;
ETCHING;
LIGHT SENSITIVE MATERIALS;
PHOTOSENSITIVITY;
SILICON NITRIDE;
POLYMERS;
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EID: 84864675611
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (2)
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References (5)
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