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Volumn , Issue , 2012, Pages 204-207

An alternative polymeric protection mask for bulk KOH etching of silicon

Author keywords

[No Author keywords available]

Indexed keywords

BULK MICROMACHINING TECHNOLOGY; DEPTH RATIO; ETCH DEPTH; ETCHING CONDITION; KOH ETCHING; KOH SOLUTION; LATERAL ETCHING; MEMSDEVICES; MICRO-CANTILEVERS; POLYMERIC COATINGS; PROCESS STEPS; PROTECTIVE LAYERS; THERMAL OXIDE LAYER; THERMAL OXIDES;

EID: 84864675611     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (2)

References (5)
  • 2
    • 41149143422 scopus 로고    scopus 로고
    • A spin-on photosensitive polymeric etch protection mask for anisotropic wet etching of silicon
    • J. Dalvi-Malhotra, X. F. Zhong, C. Planje, G. Brand and K. Yess, "A spin-on photosensitive polymeric etch protection mask for anisotropic wet etching of silicon," J. Micromech. Microeng., 18, pp. 1-8, 2008.
    • (2008) J. Micromech. Microeng. , vol.18 , pp. 1-8
    • Dalvi-Malhotra, J.1    Zhong, X.F.2    Planje, C.3    Brand, G.4    Yess, K.5
  • 3
    • 73549087021 scopus 로고    scopus 로고
    • Hybrid Simulation Approach on Mems Piezoresistive Microcantilever Sensor for Biosensing Applications
    • R. A. Rahim, B. Bais and B. Y. Majlis, "Hybrid Simulation Approach on Mems Piezoresistive Microcantilever Sensor for Biosensing Applications," Advanced Materials Research, vol. 74, pp. 243-246, 2009.
    • (2009) Advanced Materials Research , vol.74 , pp. 243-246
    • Rahim, R.A.1    Bais, B.2    Majlis, B.Y.3
  • 5
    • 34248646579 scopus 로고    scopus 로고
    • Use of silane-based primer on silicon wafers to enhance adhesion of edge-protective coatings during wet etching: Application of the TALON wrap process
    • J. Dalvi-Malhotra, G. J. Brand and X.-F. Zhong, "Use of silane-based primer on silicon wafers to enhance adhesion of edge-protective coatings during wet etching: application of the TALON wrap process," Proc. SPIE 6462, 2007.
    • (2007) Proc. SPIE 6462
    • Dalvi-Malhotra, J.1    Brand, G.J.2    Zhong, X.-F.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.