Structural characterization, EPR and thermoluminescence properties of Cd 1 - XNi xSiO 3 nanocrystalline phosphors

Materials Research Bulletin

Volumn 47, Issue 9, 2012, Pages 2306-2314

  Manjunatha, C ^a,b,c   Sunitha, D V ^d   Nagabhushana, H ^d   Sharma, S C ^d   Ashoka, S ^e   Rao, J L ^f   Nagabhushana, B M ^a,b   Chakradhar, R P S ^g  

^a M S RAMAIAH INSTITUTE OF TECHNOLOGY   (India)

^b VISVESVARAYA TECHNOLOGICAL UNIVERSITY   (India)

^c R V COLLEGE OF ENGINEERING   (India)

^d TUMKUR UNIVERSITY   (India)

^e INDIAN INSTITUTE OF SCIENCE   (India)

^f SRI VENKATESWARA UNIVERSITY   (India)

^g SURFACE ENGINEERING DIVISION   (India)

Author keywords

A. Combustion synthesis; B. Nanoparticles; C. CdSiO 3; D. Electronic paramagnetic resonance; E. Thermoluminescence

Indexed keywords

C. CDSIO 3; COMBUSTION METHOD; ELECTRON PARAMAGNETIC RESONANCE SPECTRUM; ELECTRONIC PARAMAGNETIC RESONANCE; FREQUENCY FACTORS; GLOW PEAKS; ION DOPANTS; MONOCLINIC PHASE; NANOCRYSTALLINE PHOSPHOR; NANOPHOSPHORS; OPTICAL ENERGY GAP; ORDER OF KINETICS; PARAMAGNETIC SUSCEPTIBILITY; POWDER X RAY DIFFRACTION; SCANNING ELECTRON MICROGRAPHS; SITE SYMMETRY; STRUCTURAL CHARACTERIZATION; THERMOLUMINESCENCE PROPERTIES; ULTRA-VIOLET;

ABSORPTION SPECTROSCOPY; ACTIVATION ENERGY; COMBUSTION SYNTHESIS; IONS; PARAMAGNETISM; SCANNING ELECTRON MICROSCOPY; THERMOLUMINESCENCE; X RAY DIFFRACTION;

PARAMAGNETIC RESONANCE;

EID: 84864621427     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.materresbull.2012.05.039     Document Type: Article

References (44)

1. D. Jia, J. Zhu, and B. Wu J. Electrochem. Soc. 147 2000 386 389
2. D.D. Jia, J. Zhu, and B.Q. Wu J. Lumin. 93 2001 107 114
3. L. Lin, M. Yin, C.S. Shi, and W.P. Zhang J. Alloys Compd. 455 2008 327 330
4. B. Liu, L. Kong, and C. Shi J. Lumin. 121 2007 122 123
5. C. Barthou, J. Benoit, and P. Benalloul J. Electrochem. Soc. 141 1994 524 528
6. N.K. Kyung, J. Ha-Kyun, D.P. Hee, and K. Dojin J. Lumin. 99 2002 169 173
7. Y. Kondo, K. Tanaka, R. Ota, T. Fujji, and Y.C. Ishikawa Opt Mater. 27 2005 1438 1444
8. A. Aebischer, S. Heer, D. Biner, K. Kramer, M. Haase, and H.U. Gudel Chem. Phys. Lett. 407 1-3 2005 124 128
9. W. Li, X. Feng, and H. Huang Mater Lett. 59 2005 1775 1779
10. Y.G. Choi, J.H. Baik, and J. Heo Chem. Phys. Lett. 406 2005 436 440
11. A. Majchrowski, J. Ebothe, I. Fuks-Janczarek, M. Makowska-Janusik, B. Sahraoui, and I.V. Kityk Opt. Mater. 27 4 2005 675 678
12. X. Lin-Hua, H. Ping, and H. Ping J. Phys. Chem. Solids 66 2005 918 921
13. C. Liu, J. Liu, and W. Xu Mater. Sci. Eng. B 75 2000 78 81
14. P. Yang, M. Lu, D. Xu, D. Yuan, and G. Zhou Appl. Phys. A. 73 2001 455 458
15. T. Suzuki, G.S. Murugan, and Y. Ohishi Appl. Phys. Lett. 86 2005 131903 131905
16. E. Zannoni, E. Cavalli, A. Toncelli, M. Tonelli, and M. Bettinelli J. Phys. Chem. Solids 60 1999 449 455
17. B.F. Lei, Y.L. Liu, Z.R. Ye, and C.S. Shi J. Lumin. 109 2004 215 219
18. J. Kuang, and Y. Liu Chem. Phys. Lett. 424 2006 58 62
19. B.F. Lei, Y.L. Liu, J. Liu, Z.R. Ye, and C.S. Shi J. Solid State Chem. 177 2004 1333 1337
20. X. Qu, L. Cao, W. Liu, G. Su, H. Qu, and C. Xu J. Alloy Compd. 484 2009 641 644
21. K.C. Patil, S.T. Aruna, and S. Ekambaram Curr. Opin. Solid State Mater. Sci. 2 1997 158 165
22. K.C. Patil, and T. Mimani Mag. Soc. India Bull. 22 2000 21 26
23. C.I. Merzbacher, and W.B. White J. Non-Cryst. Solids 130 1991 18 34
24. P. Klug, and L.E. Alexander X-ray Diffraction Procedure 1954 Wiley New York
25. S.B. Oadri, J.P. Yang, E.F. Skelton, and B.R. Ratna Appl. Phys. Lett. 70 1997 1020 1021
26. X. Liu, F. Zhou, M. Gu, S. Huang, B. Liu, and C. Ni Opt. Mater. 31 2008 126 130
27. Q. Meng, J. Lin, L. Fu, H. Zhang, S. Wang, and Y. Zhou J. Mater. Chem. 11 2001 3382 3386
28. R.P.S. Chakradhar, B.M. Nagabhushnam, G.T. Chandrappa, J.L.Rao, and K.P. Ramesh Appl. Magn. Reson. 33 2008 137 152
29. J.A. Weil, J.R. Bolton, and J.E. Wertz Electron Paramagnetic Resonance - Elementary Theory and Practical Applications 1994 Wiley New York p. 498
30. N.W. Aschcroft, and N.D. Mermin Solid State Physics 2001 Harcourt College Publishers New York p. 656
31. P.D. Sahare, R. Ranju, S. Numan, and S.P. Lochab J. Phys. D: Appl. Phys. 40 2007 759 764
32. L.H. Jiang, Y.L. Zhang, C.Y. Li, J.Q. Hao, and Q. Su Appl. Rad. Isotop. 68 2010 196 200
33. A.M. Noh, Y.M. Amin, R.H. Mahat, and D.A. Bradley Radiat. Phys. Chem. 61 2001 497 499
34. V.N. Makhov, A. Lushchik, Ch.B. Lushchik, M. Kirm, E. Vasil, Chenko, S. Vielhauer, V.V. Harutunyan, and E. Aleksanyam Nucl. Instrum. Methods (B) 266 2008 2949 2952
35. A.R. Lakshamanan, M.T. Jose, V. Ponnsamy, P.R. Kumar, and Vivek J. Phys. D: Appl. Phys. 35 2002 386 391
36. Puja Chawla, S.P. Lochab, and N. Singh J. Alloys Compd. 492 2010 662 666
37. S. Mahajna, and Y.S. Horowitz J. Phys. D: Appl. Phys. 30 1997 2603 2619
38. J.R. Cameron, N. Suntharalingam, and G.N. Kenney Thermoluminescent Dosimetry 1968 The University of Wisconsin Press Madison
39. S. Gharma, S.P. Lochab, and N. Singh J. Alloys Compd. 501 2010 190 192
40. C. Furetta, G. Kitis, and C.H. Kuo Nucl. Instr. Meth. Phys. Res. B 160 2000 65 72
41. K.R. Nagabhushana, B.N. Lakshminarasappa, and F. Singh Radiat. Meas. 43 2008 S651 S655
42. R. Chen, and Y. Kirish Analysis of Thermally Stimulated Processes 1981 Pergamon New York
43. G. Kittis, J.M. Gomz-Ross, and J.W.N. Tuyn J. Phys. D: Appl. Phys. 31 1998 2636 2641
44. N. Salah, P.D. Sahare, and A.A. Rupasov J. Lumin. 124 2007 357 364