SCOPUS 정보 검색 플랫폼

Applied Surface Science

Volumn 258, Issue 23, 2012, Pages 9333-9336

PLD and RF discharge combination used for preparation of photocatalytic TiO 2 layers

(3) Remsa, Jan a Mikšovský, Jan a,b Jelínek, Miroslav a,b

a CZECH TECHNICAL UNIVERSITY IN PRAGUE (Czech Republic)

b INSTITUTE OF PHYSICS (Czech Republic)

Author keywords

Photocatalysis; Pulsed laser deposition; RF discharge; Thin films; Titanium dioxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM PREPARATION; FUSED SILICA; OXIDE MINERALS; PHOTOCATALYSIS; PULSED LASER DEPOSITION; PULSED LASERS; SILICON WAFERS; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION;

CRYSTALLINE STRUCTURE; DEPOSITION CONDITIONS; PHOTOCATALYTIC CHARACTERISTICS; POLYCRYSTALLINE TITANIUM; PULSED-LASER DEPOSITION TECHNIQUE; RADIO FREQUENCY DISCHARGES; RF DISCHARGE; SUBSTRATE TEMPERATURE;

TITANIUM DIOXIDE;

EID: 84864463174 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2012.02.042 Document Type: Conference Paper

Times cited : (7)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.