Cold plasma-deposited SiO2 and amorphous Teflon AF as electret-coatings for MIS-IL solar cells

8th International Symposium on Electrets, ISE 1994 - Proceedings

Volumn , Issue , 1994, Pages 1016-1021

  Gunther, P ^a   Thielemann, C ^a   Klemberg Sapieha, J E ^b   Martinu, L ^b   Wertheimer, M R ^b  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^b Ecole Polytechque ^*  (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

COATED MATERIALS; ELECTRETS; ELECTRIC FIELDS; ELECTRIC LINES; FILM PREPARATION; METAL INSULATOR BOUNDARIES; MIS DEVICES; POLYTETRAFLUOROETHYLENES; PROTECTIVE COATINGS; SILICA; SILICON OXIDES; SILICON SOLAR CELLS;

AMORPHOUS TEFLONS; FUNCTIONAL COATING; IV CHARACTERISTICS; MATERIAL CHARACTERISTICS; METAL-INSULATOR-SEMICONDUCTORS; PREPARATION CONDITIONS; SOLAR CELL TECHNOLOGY; THIN FILM MATERIAL;

SOLAR CELLS;

EID: 84864447960     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ISE.1994.515264     Document Type: Conference Paper

References (11)

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11. Du Pont product information A New Generation of Teflon Fluorocarbon Resins For High Performance December 1989.