Thermoelectric power factor enhancement of AZO/In-AZO quantum well multilayer structures as compared to bulk films

Journal of Alloys and Compounds

Volumn 539, Issue , 2012, Pages 129-136

  Teehan, Sean ^a   Efstathiadis, Harry ^a   Haldar, Pradeep ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

Al doped ZnO; Interface roughness; Quantum well multilayers; Thermoelectrics

Indexed keywords

AL-DOPED ZNO; ELECTRICAL CONDUCTIVITY; ELECTRICAL RESISTIVITY; ELECTRONIC TRANSPORT PROPERTIES; FABRICATED STRUCTURES; INTERFACE ROUGHNESS; MULTILAYER STRUCTURES; OPERATING TEMPERATURE; THERMOELECTRIC PERFORMANCE; THERMOELECTRIC POWER FACTORS; THERMOELECTRICS;

ELECTRIC CONDUCTIVITY; MICROSTRUCTURE; MULTILAYER FILMS; MULTILAYERS; SEMICONDUCTOR QUANTUM WELLS; THERMOELECTRIC POWER; THERMOELECTRICITY; TRANSPORT PROPERTIES; ZINC OXIDE;

INTERFACES (MATERIALS);

EID: 84864401970     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2012.04.029     Document Type: Article

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