Optimal wafer site selection using forward selection component analysis

ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings

Volumn , Issue , 2012, Pages 91-96

  Prakash, P K S ^a   Honari, B ^a   Johnston, A ^b   McLoone, S F ^a  

^a NATIONAL UNIVERSITY OF IRELAND   (Ireland)

^b SEAGATE TECHNOLOGY   (United Kingdom)

Author keywords

forward selection component analysis; principal component analysis; Virtual Metrology; wafer site selection

Indexed keywords

ADVANCED PROCESS CONTROL; COMPONENT ANALYSIS; DATA SETS; FAILURE PATTERNS; FORWARD SELECTION; HIGH COSTS; IN-PROCESS MONITORING; MANUFACTURING PRECISION; METROLOGY DATA; NON-VALUE ADDED; NOVEL METHODOLOGY; OPTIMAL SITE; PRIORI KNOWLEDGE; PROCESS ISSUES; SEMICONDUCTOR MANUFACTURING; SPATIAL VARIABILITY; VIRTUAL METROLOGY; WAFER MANUFACTURING; WAFER MEASUREMENTS; WAFER METROLOGY;

INTELLIGENT CONTROL; MANUFACTURE; MEASUREMENTS; OPTIMIZATION; PRINCIPAL COMPONENT ANALYSIS; PROCESS MONITORING; SEMICONDUCTOR DEVICE MANUFACTURE; SITE SELECTION;

UNITS OF MEASUREMENT;

EID: 84863950913     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASMC.2012.6212875     Document Type: Conference Paper

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