Thickness effects on the magnetic and electrical transport properties of highly epitaxial LaBaCo 2O 5.5+δ thin films on MgO substrates

Applied Physics Letters

Volumn 101, Issue 2, 2012, Pages

  Ma, Chunrui ^a   Liu, Ming ^a   Collins, Gregory ^a   Liu, Jian ^a   Zhang, Yamei ^a   Chen, Chonglin ^a   He, Jie ^b   Jiang, Jiechao ^b   Meletis, Efstathios I ^b  

^a UNIVERSITY OF TEXAS AT SAN ANTONIO   (United States)

^b University of Texas at Arlington   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIFERROMAGNETICS; COERCIVE FIELD; DOUBLE PEROVSKITES; ELECTRICAL TRANSPORT PROPERTIES; FERROMAGNETIC BEHAVIORS; LOW TEMPERATURES; MAGNETORESISTANCE EFFECTS; MGO SUBSTRATE; SEMICONDUCTOR BEHAVIOR; THICKNESS EFFECT;

ANTIFERROMAGNETISM; ELECTRIC PROPERTIES; FILM THICKNESS; PEROVSKITE; SUBSTRATES; THIN FILMS; TRANSPORT PROPERTIES;

INTERFACES (MATERIALS);

EID: 84863936565     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4734386     Document Type: Article

References (27)

1. D. Akahoshi and Y. Ueda, J. Solid State Chem. 156 (2), 355-363 (2001). 10.1006/jssc.2000.9006
2. D. P. Kozlenko, Z. Jirak, N. O. Golosova, and B. N. Savenko, Eur. Phys. J. B 70 (3), 327-334 (2009). 10.1140/epjb/e2009-00228-x
3. M. A. Senarisrodriguez and J. B. Goodenough, J. Solid State Chem. 118 (2), 323-336 (1995). 10.1006/jssc.1995.1351
4. A. Podlesnyak, S. Streule, J. Mesot, M. Medarde, E. Pomjakushina, K. Conder, A. Tanaka, M. W. Haverkort, and D. I. Khomskii, Phys. Rev. Lett. 97 (24), 247208 (2006). 10.1103/PhysRevLett.97.247208
5. G. P. Luo, Y. S. Wang, S. Y. Chen, A. K. Heilman, C. L. Chen, C. W. Chu, Y. Liou, and N. B. Ming, Appl. Phys. Lett. 76 (14), 1908-1910 (2000). 10.1063/1.126208
6. Y. L. Yang, C. L. Chen, S. Y. Chen, C. W. Chu, and A. J. Jacobson, J. Electrochem. Soc. 147 (11), 4001-4007 (2000). 10.1149/1.1394010
7. Y. M. L. Yang, A. J. Jacobson, C. L. Chen, G. P. Luo, K. D. Ross, and C. W. Chu, Appl. Phys. Lett. 79 (6), 776-778 (2001). 10.1063/1.1390316
8. Y. M. Zhang and M. H. Whangbo, Inorg. Chem. 50 (21), 10643-10647 (2011). 10.1021/ic200963g
9. Z. Yuan, J. Liu, C. L. Chen, C. H. Wang, X. G. Luo, X. H. Chen, G. T. Kim, D. X. Huang, S. S. Wang, A. J. Jacobson, and W. Donner, Appl. Phys. Lett. 90 (21), 212111 (2007). 10.1063/1.2741407
10. M. M. Seikh, C. Simon, V. Caignaert, V. Pralong, M. B. Lepetit, S. Boudin, and B. Raveau, Chem. Mater. 20 (1), 231-238 (2008). 10.1021/cm7026652
11. S. Roy, I. S. Dubenko, M. Khan, E. M. Condon, J. Craig, N. Ali, W. Liu, and B. S. Mitchell, Phys. Rev. B 71 (2), 024419 (2005). 10.1103/PhysRevB.71. 024419
12. R. Mahendiran and A. K. Raychaudhuri, Phys. Rev. B 54 (22), 16044-16052 (1996). 10.1103/PhysRevB.54.16044
13. K. Muta, Y. Kobayashi, and K. Asai, J. Phys. Soc. Jpn. 71 (11), 2784-2791 (2002). 10.1143/JPSJ.71.2784
14. J. Wu and C. Leighton, Phys. Rev. B 67 (17), 174408 (2003). 10.1103/PhysRevB.67.174408
15. F. Fauth, E. Suard, V. Caignaert, B. Domenges, I. Mirebeau, and L. Keller, Eur. Phys. J. B 21 (2), 163-174 (2001). 10.1007/PL00011119
16. T. Nakajima, M. Ichihara, and Y. Ueda, J. Phys. Soc. Jpn. 74 (5), 1572-1577 (2005). 10.1143/JPSJ.74.1572
17. A. K. Kundu, E. L. Rautama, P. Boullay, V. Caignaert, V. Pralong, and B. Raveau, Phys. Rev. B 76 (18), 184432 (2007). 10.1103/PhysRevB.76.184432
18. E. L. Rautama, P. Boullay, A. K. Kundu, V. Caignaert, V. Pralong, M. Karppinen, and B. Raveau, Chem. Mater. 20 (8), 2742-2750 (2008). 10.1021/cm703314p
19. E. L. Rautama, V. Caignaert, P. Boullay, A. K. Kundu, V. Pralong, M. Karppinen, C. Ritter, and B. Raveau, Chem. Mater. 21 (1), 102-109 (2009). 10.1021/cm8021775
20. J. Liu, M. Liu, G. Collins, C. L. Chen, X. N. Jiang, W. Q. Gong, A. J. Jacobson, J. He, J. C. Jiang, and E. I. Meletis, Chem. Mater. 22 (3), 799-802 (2010). 10.1021/cm901479g
21. M. Liu, J. Liu, G. Collins, C. R. Ma, C. L. Chen, J. He, J. C. Jiang, E. I. Meletis, A. J. Jacobson, and Q. Y. Zhang, Appl. Phys. Lett. 96 (13), 132106 (2010). 10.1063/1.3378877
22. J. Liu, G. Collins, M. Liu, C. L. Chen, J. C. Jiang, E. I. Meletis, Q. Y. Zhang, and C. Dong, Appl. Phys. Lett. 97 (9), 094101 (2010). 10.1063/1.3484964
23. J. He, J. C. Jiang, J. Liu, M. Liu, G. Collins, C. R. Ma, C. L. Chen, and E. I. Meletis, Thin Solid Films 519 (13), 4371-4376 (2011). 10.1016/j.tsf.2011.02.015
24. M. G. Blamire, B. S. Teo, J. H. Durrell, N. D. Mathur, Z. H. Barber, J. L. M. Driscoll, L. F. Cohen, and J. E. Evetts, J. Magn. Magn. Mater. 191 (3), 359-367 (1999). 10.1016/S0304-8853(98)00375-8
25. A. A. Taskin, A. N. Lavrov, and Y. Ando, Phys. Rev. B 71 (13), 134414 (2005). 10.1103/PhysRevB.71.134414
26. A. K. Kundu, K. Ramesha, R. Seshadri, and C. N. R. Rao, J. Phys.: Condens. Matter 16 (45), 7955-7966 (2004). 10.1088/0953-8984/16/45/018
27. A. K. Kundu, B. Raveau, V. Caignaert, E. L. Rautama, and V. Pralong, J. Phys.: Condens. Matter 21 (5), 056007 (2009). 10.1088/0953-8984/21/5/056007