Plasmon nanofocusing in a dielectric hemisphere covered in tapered metal film

Optics Express

Volumn 20, Issue 12, 2012, Pages 12866-12876

  Mason, Daniel R ^a   Gramotnev, Dmitri K ^a   Kim, Kwang S ^b,c  

^a Seoul National University   (South Korea)

^b Nanophotonics Pty Ltd   (Australia)

^c Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELDS; FINITE ELEMENT METHOD; METALLIC FILMS; OPTICAL FIBERS; PLASMONS;

DIELECTRIC HEMISPHERES; DIFFRACTION LIMITED; ENVIRONMENTAL INTERFERENCE; FOCAL SPOT; LOCAL ELECTRIC FIELD; MECHANICALLY ROBUST; METAL FILM; METAL WEDGES; NANO-FOCUSING; PHYSICAL INTERPRETATION; SUBWAVELENGTH IMAGING; SUBWAVELENGTH RESOLUTION; THIN GOLD FILM;

PROBES;

EID: 84863735202     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.20.012866     Document Type: Article

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