-
1
-
-
63649143060
-
-
10.1088/0022-3727/42/5/053001
-
P. Bruggeman and C. Leys, J. Phys. D 42, 053001 (2009). 10.1088/0022-3727/42/5/053001
-
(2009)
J. Phys. D
, vol.42
, pp. 053001
-
-
Bruggeman, P.1
Leys, C.2
-
2
-
-
57649134957
-
-
10.1063/1.3006348
-
O. Sakai, M. Kimura, T. Shirafuji, and K. Tachibana, Appl. Phys. Lett. 93, 231501 (2008). 10.1063/1.3006348
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 231501
-
-
Sakai, O.1
Kimura, M.2
Shirafuji, T.3
Tachibana, K.4
-
3
-
-
63649158865
-
-
10.1088/0963-0252/18/2/025017
-
P. Bruggeman, D. Schram, M. A. Gonz'alez, R. Rego, M. G. Kong, and C. Leys, Plasma Sources Sci. Technol. 18, 025017 (2009). 10.1088/0963-0252/18/2/ 025017
-
(2009)
Plasma Sources Sci. Technol.
, vol.18
, pp. 025017
-
-
Bruggeman, P.1
Schram, D.2
Gonz'Alez, M.A.3
Rego, R.4
Kong, M.G.5
Leys, C.6
-
5
-
-
77949515795
-
-
10.1088/0022-3727/43/12/124005
-
P. Bruggeman, T. Verreycken, M. A. Gonz'alez, J. L. Walsh, M. G. Kong, C. Leys, and D. C. Schram, J. Phys. D 43, 124005 (2010). 10.1088/0022-3727/43/12/ 124005
-
(2010)
J. Phys. D
, vol.43
, pp. 124005
-
-
Bruggeman, P.1
Verreycken, T.2
Gonz'Alez, M.A.3
Walsh, J.L.4
Kong, M.G.5
Leys, C.6
Schram, D.C.7
-
6
-
-
65449173197
-
-
10.1063/1.3122148
-
Y. Sakiyama, T. Tomai, M. Miyano, and D. B. Graves, Appl. Phys. Lett. 94, 161501 (2009). 10.1063/1.3122148
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 161501
-
-
Sakiyama, Y.1
Tomai, T.2
Miyano, M.3
Graves, D.B.4
-
7
-
-
50149118139
-
-
10.1007/s11090-008-9142-2
-
T. Maehara, I. Miyamoto, K. Kurokawa, and Y. Hashimoto, Plasma Chem. Plasma Process. 28, 467 (2008). 10.1007/s11090-008-9142-2
-
(2008)
Plasma Chem. Plasma Process.
, vol.28
, pp. 467
-
-
Maehara, T.1
Miyamoto, I.2
Kurokawa, K.3
Hashimoto, Y.4
-
8
-
-
0035969532
-
-
10.1038/35107141
-
N. Sano, H. Wang, M. Chhowalla, I. Alexandrou, and G. A. J. Amaratunga, Nature (London) 414, 506 (2001). 10.1038/35107141
-
(2001)
Nature (London)
, vol.414
, pp. 506
-
-
Sano, N.1
Wang, H.2
Chhowalla, M.3
Alexandrou, I.4
Amaratunga, G.A.J.5
-
9
-
-
0036733897
-
-
10.1063/1.1498884
-
N. Sano, H. Wang, I. Alexandrou, M. Chhowalla, K. B. K. Teo, and G. A. J. Amaratunga, J. Appl. Phys. 92, 2783 (2002). 10.1063/1.1498884
-
(2002)
J. Appl. Phys.
, vol.92
, pp. 2783
-
-
Sano, N.1
Wang, H.2
Alexandrou, I.3
Chhowalla, M.4
Teo, K.B.K.5
Amaratunga, G.A.J.6
-
10
-
-
71749109783
-
-
10.1063/1.3259377
-
C. Poonjarernsilp, N. Sano, H. Tamon, and T. Charinpanitkul, J. Appl. Phys. 106, 104315 (2009). 10.1063/1.3259377
-
(2009)
J. Appl. Phys.
, vol.106
, pp. 104315
-
-
Poonjarernsilp, C.1
Sano, N.2
Tamon, H.3
Charinpanitkul, T.4
-
12
-
-
43149103386
-
-
10.1088/0963-0252/17/2/025012
-
P. Bruggeman, E. Ribezl, A. Maslani, J. Degroote, A. Malesevic, R. Rego, J. Vierendeels, and C. Leys, Plasma Sources Sci. Technol. 17, 025012 (2008). 10.1088/0963-0252/17/2/025012
-
(2008)
Plasma Sources Sci. Technol.
, vol.17
, pp. 025012
-
-
Bruggeman, P.1
Ribezl, E.2
Maslani, A.3
Degroote, J.4
Malesevic, A.5
Rego, R.6
Vierendeels, J.7
Leys, C.8
-
15
-
-
34249889884
-
-
10.1063/1.2736945
-
Y. C. Hong and H. S. Uhm, Phys. Plasmas 14, 053503 (2007). 10.1063/1.2736945
-
(2007)
Phys. Plasmas
, vol.14
, pp. 053503
-
-
Hong, Y.C.1
Uhm, H.S.2
-
17
-
-
0000258428
-
-
10.1103/PhysRev.33.195
-
L. Tonks and I. Langmuir, Phys. Rev. 33, 195 (1929). 10.1103/PhysRev.33. 195
-
(1929)
Phys. Rev.
, vol.33
, pp. 195
-
-
Tonks, L.1
Langmuir, I.2
-
18
-
-
33747601412
-
-
10.1088/0022-3727/39/17/015
-
J. Y. Park, P. V. Kostyuk, S. B. Han, J. S. Kim, C. N. Vu, and H. W. Lee, J. Phys. D 39, 3805 (2006). 10.1088/0022-3727/39/17/015
-
(2006)
J. Phys. D
, vol.39
, pp. 3805
-
-
Park, J.Y.1
Kostyuk, P.V.2
Han, S.B.3
Kim, J.S.4
Vu, C.N.5
Lee, H.W.6
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