In-situ fabrication of CNT/TiO 2 interpenetrating network film on nickel substrate by chemical vapour deposition and application in photoassisted water electrolysis

Catalysis Communications

Volumn 21, Issue , 2012, Pages 27-31

  Ma, Lei ^a   Chen, Aiping ^a   Zhang, Zhe ^a   Lu, Jindong ^a   He, Hongbo ^a   Li, Chunzhong ^a  

^a East China University of Science and Technology   (China)

Author keywords

CNT TiO 2 interpenetrating network film; Hydrogen evolution rate; In situ CVD method; Photoassisted water electrolysis

Indexed keywords

AFM; CHEMICAL VAPOUR DEPOSITION; HYDROGEN EVOLUTION RATE; IN-SITU; IN-SITU FABRICATION; NI SUBSTRATES; NICKEL SUBSTRATES; PHOTOASSISTED WATER ELECTROLYSIS; TIO; UV REGION; WATER ELECTROLYSIS; XRD;

CHEMICAL VAPOR DEPOSITION; HIGH ENERGY PHYSICS; HYDROGEN; NICKEL; TITANIUM DIOXIDE; VAPORS;

FILM GROWTH;

EID: 84863338957     PISSN: 15667367     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.catcom.2012.01.013     Document Type: Article

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