Layer-by-layer deposition of all-nanoparticle multilayers in confined geometries

ACS Applied Materials and Interfaces

Volumn 4, Issue 1, 2012, Pages 391-396

  Derocher, Jonathan P ^a   Mao, Pan ^a   Kim, Jun Young ^a   Han, Jongyoon ^a,b   Rubner, Michael F ^a   Cohen, Robert E ^a  

^a Massachusetts Institute of Technology   (United States)

^b Department of Electrical Engineering and Computer Science   (United States)

Author keywords

confined geometry; directed assembly; layer by layer assembly; nanochannel; nanofluidics; nanoparticle

Indexed keywords

CHANNEL GEOMETRY; CONFINED GEOMETRIES; CONFORMAL COATINGS; DIRECTED ASSEMBLY; FLAT SUBSTRATES; HIGH ASPECT RATIO; LARGE AGGREGATES; LAYER BY LAYER DEPOSITION; LAYER-BY-LAYER ASSEMBLIES; MULTILAYER ASSEMBLIES; NANO CHANNELS; NANO-POROUS; NANOCHANNEL; NANOPARTICLE MULTILAYERS; SILICA NANOPARTICLES; TITANIA; VOID VOLUME FRACTION;

ADSORPTION; ASPECT RATIO; CALCINATION; DEPOSITION; GEOMETRY; MULTILAYER FILMS; NANOFLUIDICS; NANOPARTICLES; SILICA; TITANIUM DIOXIDE; VOID FRACTION;

MULTILAYERS;

EID: 84863048918     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am2014647     Document Type: Article

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