Diode behavior of electrophoretically deposited polyaniline on TiO 2 nanoparticulate thin film electrode

Journal of Nanoscience and Nanotechnology

Volumn 11, Issue 2, 2011, Pages 1559-1564

  Ameen, Sadia ^a   Akhtar, M Shaheer ^a   Kim, Young Soon ^a   Yang, O Bong ^a   Shin, Hyung Shik ^a  

^a Chonbuk National University   (South Korea)

Author keywords

Electrophoretic deposition; I V characteristics; Nanoparticulates; Polyaniline; XPS analysis

Indexed keywords

APPLIED VOLTAGES; CURRENT VOLTAGE; ELECTROPHORETIC DEPOSITIONS; HETEROSTRUCTURE DEVICES; I - V CURVE; INORGANIC/ORGANIC; IV CHARACTERISTICS; MESOPOROUS TIO; NANOPARTICULATES; OPTICAL STUDY; P-TYPE; PANI/TIO; REVERSE BIAS; SCAN RATES; SURFACE BONDING; THIN-FILM ELECTRODE; TIO; XPS ANALYSIS;

DEPOSITION; ELECTROPHORESIS; NANOPARTICLES; POLYANILINE; THIN FILMS; TITANIUM; X RAY PHOTOELECTRON SPECTROSCOPY;

TITANIUM DIOXIDE;

EID: 84863012213     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2011.3377     Document Type: Conference Paper

References (29)

1. T. A. Skotheim, R. L. Elsenbaumer, and J. R. Reynolds, Handbook of Conducting Polymers, 2nd edn., Marcel Dekker, New York (1997).
2. X. G. Li, H. Y. Wang, and M. R. Huang, Macromolecules 40, 1489 (2007).
3. Z. Xu, S. Jeedigunta, and A. Kumar, J. Nanosci. Nanotechnol. 7, 2092 (2007).
4. R. K. Gupta and R. A. Singh, Compos. Sci. Tech. 65, 677 (2005).
5. V. D. Michailetchi, L. J. A. Koster, P. W. M. Blom, C. Meizer, B. de Boer, J. K. J. Vanduren, and R. A. J. Janssen, Adv. Funct. Mater. 15, 795 (2005).
6. G. D. Sharma, V. S. Choudhary, and M. S. Roy, Sol. Energy Mater. Sol. Cells 91, 275 (2007).
7. S. Xiong, S. Huang, A. Tang, and F. Teng, J. Nanosci. Nanotechnol. 8, 1341 (2008).
8. T. Uchikoshi, S. Furumi, T. S. Suzuki, and Y. Sakka, J. Ceram. Soc. Jpn. 114, 55 (2006).
9. J. Li, Y. J. Wu, H. Tanaka, T. Yamamoto, and M. Kuwabara, J. Am. Ceram. Soc. 87, 1578 (2004).
10. W. Zheng, M. Angelopoulos, A. J. Epstein, and A. G. MacDiarmid, Macromolecules 30, 2953 (1997).
11. P. R. Somani, R. Marimuthu, U. P. Mulik, S. R. Sainkar, and D. P. Amalnerkar, Synth. Met. 106, 45 (1999).
12. Z. Niu, Z. Yang, Z. Hu, Y. Lu, and C. C. Han, Adv. Funct. Mater., 13, 949 (2003).
13. H. C. Pant, M. K. Patra, S. C. Negi, A. Bhatia, S. R. Vadera, and N. Kumar, Bull. Mater. Sci. 9, 379 (2006).
14. Z. Xiuqin, Y. Guolun, D. Hanming, and S. Yongkui, Mat. Chem. Phys 102, 249 (2007).
15. D. Han, Y. Chu, L. Yang, Y. Liu, and Z. Lv, Coll. Surf. A: Physicochem. Eng. Aspects 259, 179 (2005).
16. J. C. Xu, W. M. Liu, and H. L. Li, Mater. Sci. Eng. C 25, 444 (2005).
17. A. P. Monkman, G. C. Stevens, and D. Bloor, J. Phys. D. Appl. Phys. 24, 738 (1991).
18. M. S. Wu, T. C. Wen, and A. Gopalan, J. Electrochem. Soc. 148, D65 (2001).
19. W. C. Chen, T.-C. Wen, and A. Gopalan, Electrochim. Acta 47, 4195 (2002).
20. G. C. Bond and S. Flamerz, Appl. Catal. 46, 89 (1989).
21. D. Simon, C. Perrin, and J. Bardolle, J. Microsc. Spectrosc. Electron. 1, 175 (1976).
22. T. L. Barr, J. Vac. Sci. Technol. A9 3, 1793 (1991).
23. Y. Chen, E. T. Kang, K. G. Neon, S. L. Lim, Z. H. Ma, and K. L. Tan, Colloid Polym Sci. 73, 279 (2001).
24. E. T. Kang, K. G. Neoh, and K. L. Tan, Prog. Polym. Sci. 23, 277 (1998).
25. S. N. Kumar, F. Gaillard, G. Bouyssoux, and A. Sartre, Synth. Met. 36, 111 (1990).
26. S. Mridha and D. Basak, Appl. Phys. Lett. 92, 142111 (2008).
27. B. Xu, Y. Ovachekov, M. Bai, A. N. Caruso, A. V. Sorokin, S. Ducharme, B. Doudin, and P. A. Dowben, Appl. Phys. Lett. 81, 4281 (2002).
28. R. V. Vardhanan, L. Zhou, and Z. Gao, Thin Solid Films 350, 283 (1999).
29. N. I. Kovtyukhova, A. D. Gorchinskiy, and C. Waraksa, Mater. Sci. Eng. B 6970, 424 (2000).