Degradation of bisphenol A using UV and UV/H2O2 processes

Water Environment Research

Volumn 83, Issue 12, 2011, Pages 2154-2158

  Felis, Ewa ^a,b   Ledakowicz, Stanisław ^a   Miller, Jacek S ^a  

^a LODZ UNIVERSITY OF TECHNOLOGY   (Poland)

^b SILESIAN UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Bisphenol A; Hydroxyl radicals; Quantum yield; UV radiation

Indexed keywords

ACTIVATED SLUDGE PROCESS; BIOLOGICAL WATER TREATMENT; EPOXY RESINS; QUANTUM YIELD; RATE CONSTANTS; ULTRAVIOLET RADIATION; WASTEWATER TREATMENT;

ACTIVATED SLUDGE; BIOLOGICAL WASTEWATER TREATMENT PROCESS; BIS-PHENOL A; CALCULATED VALUES; HYDROPHOBIC PROPERTIES; HYDROXYL RADICALS; INDUSTRIAL WASTEWATERS; PLASTIC INDUSTRY;

PHENOLS;

4,4' ISOPROPYLIDENEDIPHENOL; BICARBONATE; HYDROGEN PEROXIDE; HYDROXYL RADICAL;

ANION; ANTIOXIDANT; DEGRADATION; DOMESTIC WASTE; HYDROGEN PEROXIDE; HYDROPHOBICITY; HYDROXYL RADICAL; INDUSTRIAL WASTE; PHENOLIC COMPOUND; PLASTIC; REACTION RATE; RESIN; ULTRAVIOLET RADIATION; WASTEWATER;

ABSORPTION; ARTICLE; BIODEGRADATION; HYDROPHOBICITY; PRIORITY JOURNAL; QUANTUM YIELD; ULTRAVIOLET RADIATION; WASTE WATER MANAGEMENT;

EID: 84862908987     PISSN: 10614303     EISSN: 15547531     Source Type: Journal    
DOI: 10.2175/106143011X12989211841214     Document Type: Article

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