Raman and infrared spectroscopy of α and β phases of thin nickel hydroxide films electrochemically formed on nickel

Journal of Physical Chemistry A

Volumn 116, Issue 25, 2012, Pages 6771-6784

  Hall, David S ^a,b   Lockwood, David J ^b   Poirier, Shawn ^b   Bock, Christina ^b   MacDougall, Barry R ^a,b  

^a UNIVERSITY OF OTTAWA   (Canada)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

BASIFICATION; FACTOR GROUP ANALYSIS; GALVANOSTATICS; KEY MATERIALS; KOH SOLUTION; LATTICE MODES; MIXED SAMPLES; NICKEL HYDROXIDE FILMS; NICKEL SALTS; RAMAN AND INFRARED SPECTROSCOPY; SAMPLE SURFACE; STRETCHING MODES; STRUCTURAL DETAILS; STRUCTURAL DISORDERS; STRUCTURAL ORIGIN;

CHEMICAL PROPERTIES; CRYSTAL DEFECTS; FACTOR ANALYSIS; INFRARED SPECTROSCOPY; NICKEL; PHOTOELECTRONS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

NICKEL DEPOSITS;

EID: 84862886712     PISSN: 10895639     EISSN: 15205215     Source Type: Journal    
DOI: 10.1021/jp303546r     Document Type: Article

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