On the UV-induced polymeric behavior of chinese lacquer

ACS Applied Materials and Interfaces

Volumn 3, Issue 2, 2011, Pages 482-489

  Xia, Jianrong ^a,b   Lin, Jinhuo ^a,b   Xu, Yanlian ^a,b   Chen, Qinhui ^a,b  

^a FUJIAN NORMAL UNIVERSITY   (China)

^b FUJIAN KEY LABORATORY OF POLYMER MATERIALS   (China)

Author keywords

Chinese lacquer; Coatings; Cross linking; Photopolymerization; Pyrolysis; Radical polymerization; Semiquinone radicals; UV irradiation

Indexed keywords

CHINESE LACQUER; COVALENT BONDING; CURING RATES; FAST-CURE; HIGH-PRESSURE MERCURY LAMP; HYDROXYL GROUPS; LACQUER FILMS; LACQUER SAP; MAIN COMPONENT; NEW APPLICATIONS; PHENYL RINGS; PHOTO-INITIATOR; PROTECTION AND RESTORATION; REACTIVE GROUP; SEMIQUINONE RADICALS; SIDE-CHAINS; SPECIFIC COMPONENT; UNSATURATED CHAINS; UV EXPOSURE; UV IRRADIATION; UV SOURCES; UV-CURING;

ATOM TRANSFER RADICAL POLYMERIZATION; CURING; IRRADIATION; LACQUERING; MERCURY (METAL); OLEFINS; PHENOLS; PHOTOPOLYMERIZATION; POLYMERIZATION; PROTECTIVE COATINGS; PYROLYSIS; UNSATURATED POLYMERS;

LACQUERS;

EID: 84862832962     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am1010578     Document Type: Article

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