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Volumn 33, Issue 3, 2012, Pages 330-332

Graphene-side-gate engineering

Author keywords

Electrostatics; graphene field effect transistor (FET); side gate

Indexed keywords

BI-LAYER; ELECTRICAL TRANSPORT CHARACTERISTICS; MESOSCOPIC DEVICES; MODULATION EFFICIENCY; SIDE GATE; TRANSPORT MEASUREMENTS; VOLTAGE BIASING;

EID: 84862825729     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2011.2180355     Document Type: Article
Times cited : (17)

References (9)
  • 6
    • 84866905034 scopus 로고    scopus 로고
    • Complementary-type graphene inverters operating at room-temperature
    • Jun.
    • H.-Y. Chen and J. Appenzeller, "Complementary-type graphene inverters operating at room-temperature," in Proc. 69th Annu. DRC, Jun. 2011, pp. 33-34.
    • Proc. 69th Annu. DRC , vol.2011 , pp. 33-34
    • Chen, H.-Y.1    Appenzeller, J.2
  • 8
    • 77954346077 scopus 로고    scopus 로고
    • Ambipolar graphene field effect transistors by local metal side gates
    • Jul.
    • J. F. Tian, L. A. Jauregui, G. Lopez, H. Cao, and Y. P. Chen, "Ambipolar graphene field effect transistors by local metal side gates," Appl. Phys. Lett., vol. 96, no. 26, p. 263 110, Jul. 2010.
    • (2010) Appl. Phys. Lett. , vol.96 , Issue.26 , pp. 263
    • Tian, J.F.1    Jauregui, L.A.2    Lopez, G.3    Cao, H.4    Chen, Y.P.5
  • 9
    • 77956444490 scopus 로고    scopus 로고
    • Silicon nitride gate dielectrics and band gap engineering in graphene layers
    • Aug.
    • W. Zhu, D. Neumayer, V. Perebeinos, and P. Avouris, "Silicon nitride gate dielectrics and band gap engineering in graphene layers," Nano Lett., vol. 10, no. 9, pp. 3572-3576, Aug. 2010.
    • (2010) Nano Lett. , vol.10 , Issue.9 , pp. 3572-3576
    • Zhu, W.1    Neumayer, D.2    Perebeinos, V.3    Avouris, P.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.