Effects of frequency on growth process of plasma electrolytic oxidation coating

Materials Chemistry and Physics

Volumn 132, Issue 2-3, 2012, Pages 909-915

  Zhang, Xuelin ^a,b   Zhang, Yufeng ^a   Chang, Limin ^b   Jiang, Zhaohua ^a   Yao, Zhongping ^a   Liu, Xiaowei ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b JILIN NORMAL UNIVERSITY   (China)

Author keywords

Ceramics; Coatings; Electrochemical techniques; Oxidation; Plasma deposition

Indexed keywords

COATINGS; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTROLYSIS; ELECTROLYTIC ANALYSIS; PLASMA DEPOSITION; WAVEFORM ANALYSIS;

CERAMICS; ELECTROCHEMICAL TECHNIQUES; GROWTH PROCESS; MICRODISCHARGES; PLASMA ELECTROLYTIC OXIDATION; PLASMA ELECTROLYTIC OXIDATION COATINGS; TERMINATION VOLTAGE; VOLTAGE RANGES;

OXIDATION;

EID: 84862819918     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2011.12.032     Document Type: Article

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