Processing of Foturan ® glass ceramic substrates for micro-solid oxide fuel cells

Journal of the European Ceramic Society

Volumn 32, Issue 12, 2012, Pages 3229-3238

  Tolke R ^a   Bieberle Hutter A ^a   Evans, A ^a   Rupp, J L M ^a,b   Gauckler, L J ^a  

^a ETH ZURICH   (Switzerland)

^b Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

Foturan ; HF etching; Micro device; Micro solid oxide fuel cell; Photostructurable glass ceramic

Indexed keywords

ACID SOLUTIONS; CERAMIC SUBSTRATES; ETCHING RATE; HF ETCHING; LINEAR RATE; MAXIMUM POWER DENSITY; MICRO DEVICES; OXIDE FUEL CELLS; PHOTOSTRUCTURABLE GLASS CERAMICS; POTENTIAL SUBSTRATE; PT ANODES; PT CATHODE;

ASPECT RATIO; ETCHING; GLASS CERAMICS; HYDROFLUORIC ACID; OPEN CIRCUIT VOLTAGE; PLATINUM; SOLID OXIDE FUEL CELLS (SOFC); SURFACE ROUGHNESS; YTTRIA STABILIZED ZIRCONIA; ZIRCONIA;

SUBSTRATES;

EID: 84862492427     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jeurceramsoc.2012.04.006     Document Type: Article

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