-
1
-
-
0022594397
-
-
10.1063/1.96937
-
C. Tang, Appl. Phys. Lett. 48, 183 (1986). 10.1063/1.96937
-
(1986)
Appl. Phys. Lett.
, vol.48
, pp. 183
-
-
Tang, C.1
-
2
-
-
70350774564
-
-
10.1038/nphoton.2009.192
-
H. Y. Chen, J. H. Hou, S. Q. Zhang, Y. Y. Liang, G. W. Yang, Y. Yang, L. P. Yu, Y. Wu, and G. Li, Nat. Photonics. 3, 649 (2009). 10.1038/nphoton.2009.192
-
(2009)
Nat. Photonics.
, vol.3
, pp. 649
-
-
Chen, H.Y.1
Hou, J.H.2
Zhang, S.Q.3
Liang, Y.Y.4
Yang, G.W.5
Yang, Y.6
Yu, L.P.7
Wu, Y.8
Li, G.9
-
3
-
-
80054800390
-
-
10.1002/adma.201103006
-
Z. He, C. Zhong, X. Huang, W. Y. Wong, H. Wu, L. Chen, S. Su, and Y. Cao, Adv. Mater. 23, 4636 (2011). 10.1002/adma.201103006
-
(2011)
Adv. Mater.
, vol.23
, pp. 4636
-
-
He, Z.1
Zhong, C.2
Huang, X.3
Wong, W.Y.4
Wu, H.5
Chen, L.6
Su, S.7
Cao, Y.8
-
4
-
-
25144514902
-
-
10.1063/1.2008386
-
G. Li, V. Shrotriya, Y. Yao, and Y. Yang, J. Appl. Phys. 98, 043704 (2005). 10.1063/1.2008386
-
(2005)
J. Appl. Phys.
, vol.98
, pp. 043704
-
-
Li, G.1
Shrotriya, V.2
Yao, Y.3
Yang, Y.4
-
6
-
-
80053971368
-
-
10.1039/c1jm12300a
-
D. H. Ko, J. R. Tumbleston, A. Gadisa, M. Aryal, Y. Liu, R. Lopez, and E. T. Samulski, J. Mater. Chem. 21, 16293 (2011). 10.1039/c1jm12300a
-
(2011)
J. Mater. Chem.
, vol.21
, pp. 16293
-
-
Ko, D.H.1
Tumbleston, J.R.2
Gadisa, A.3
Aryal, M.4
Liu, Y.5
Lopez, R.6
Samulski, E.T.7
-
7
-
-
33644878875
-
-
10.1002/adma.200501825
-
J. Y. Kim, S. H. Kim, H. H. Lee, K. Lee, W. Ma, X. Gong, and A. J. Heeger, Adv. Mater. 18, 572 (2006). 10.1002/adma.200501825
-
(2006)
Adv. Mater.
, vol.18
, pp. 572
-
-
Kim, J.Y.1
Kim, S.H.2
Lee, H.H.3
Lee, K.4
Ma, W.5
Gong, X.6
Heeger, A.J.7
-
8
-
-
33750189004
-
-
10.1063/1.2362974
-
M. Y. Chan, S. L. Lai, K. M. Lau, C. S. Lee, and S. T. Lee, Appl. Phys. Lett. 89, 163515 (2006). 10.1063/1.2362974
-
(2006)
Appl. Phys. Lett.
, vol.89
, pp. 163515
-
-
Chan, M.Y.1
Lai, S.L.2
Lau, K.M.3
Lee, C.S.4
Lee, S.T.5
-
9
-
-
34548693225
-
-
10.1063/1.2784961
-
J. Gilot, I. Barbu, M. M. Wienk, and R. A. J. Janssen, Appl. Phys. Lett. 91, 113520 (2007). 10.1063/1.2784961
-
(2007)
Appl. Phys. Lett.
, vol.91
, pp. 113520
-
-
Gilot, J.1
Barbu, I.2
Wienk, M.M.3
Janssen, R.A.J.4
-
10
-
-
45749146187
-
-
10.1063/1.2937844
-
J. K. Lee, N. E. Coates, S. Cho, N. S. Cho, D. Moses, G. C. Bazan, K. Lee, and A. J. Heeger, Appl. Phys. Lett. 92, 243308 (2008). 10.1063/1.2937844
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 243308
-
-
Lee, J.K.1
Coates, N.E.2
Cho, S.3
Cho, N.S.4
Moses, D.5
Bazan, G.C.6
Lee, K.7
Heeger, A.J.8
-
11
-
-
67650470256
-
-
10.1063/1.3159622
-
A. Roy, S. H. Park, S. Cowan, M. H. Tong, S. Cho, K. Lee, and A. J. Heeger, Appl. Phys. Lett. 95, 013302 (2009). 10.1063/1.3159622
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 013302
-
-
Roy, A.1
Park, S.H.2
Cowan, S.3
Tong, M.H.4
Cho, S.5
Lee, K.6
Heeger, A.J.7
-
12
-
-
67650732395
-
-
10.1016/j.orgel.2009.05.017
-
J. S. Huang, C. Y. Chou, M. Y. Liu, K. H. Tsai, W. H. Lin, and C. F. Lin, Org. Electron. 10, 1060 (2009). 10.1016/j.orgel.2009.05.017
-
(2009)
Org. Electron.
, vol.10
, pp. 1060
-
-
Huang, J.S.1
Chou, C.Y.2
Liu, M.Y.3
Tsai, K.H.4
Lin, W.H.5
Lin, C.F.6
-
14
-
-
0033907849
-
-
10.1002/(SICI)1521-4095(200002)12:3<189::AID-ADMA189>3.0.CO;2-2
-
L. S. Roman, O. Inganäs, T. Granlund, T. Nyberg, M. Svensson, M. R. Andersson, and J. C. Hummelen, Adv. Mater. 12, 189 (2000). 10.1002/(SICI)1521- 4095(200002)12:3<189::AID-ADMA189>3.0.CO;2-2
-
(2000)
Adv. Mater.
, vol.12
, pp. 189
-
-
Roman, L.S.1
Inganäs, O.2
Granlund, T.3
Nyberg, T.4
Svensson, M.5
Andersson, M.R.6
Hummelen, J.C.7
-
15
-
-
35548951330
-
-
10.1063/1.2802561
-
S. I. Na, S. S. Kim, S. S. Kwon, J. Jo, J. Kim, T. Lee, and D. Y. Kim, Appl. Phys. Lett. 91, 173509 (2007). 10.1063/1.2802561
-
(2007)
Appl. Phys. Lett.
, vol.91
, pp. 173509
-
-
Na, S.I.1
Kim, S.S.2
Kwon, S.S.3
Jo, J.4
Kim, J.5
Lee, T.6
Kim, D.Y.7
-
16
-
-
57849144746
-
-
10.1002/adfm.200800683
-
S. I. Na, S. S. Kim, J. Jo, S. H. Oh, J. Kim, and D. Y. Kim, Adv. Funct. Mater. 18, 3956 (2008). 10.1002/adfm.200800683
-
(2008)
Adv. Funct. Mater.
, vol.18
, pp. 3956
-
-
Na, S.I.1
Kim, S.S.2
Jo, J.3
Oh, S.H.4
Kim, J.5
Kim, D.Y.6
-
17
-
-
70349873844
-
-
10.1002/smll.200900666
-
J. H. Lee, D. W. Kim, H. Jang, J. K. Choi, J. Geng, J. W. Jung, S. C. Yoon, and H. T. Jung, Small 5, 2139 (2009). 10.1002/smll.200900666
-
(2009)
Small
, vol.5
, pp. 2139
-
-
Lee, J.H.1
Kim, D.W.2
Jang, H.3
Choi, J.K.4
Geng, J.5
Jung, J.W.6
Yoon, S.C.7
Jung, H.T.8
-
18
-
-
67650373488
-
-
10.1021/nl901232p
-
D. H. Ko, J. R. Tumbleston, L. Zhang, S. Williams, J. M. DeSimone, R. Lopez, and E. T. Samulski, Nano Lett. 9, 2742 (2009). 10.1021/nl901232p
-
(2009)
Nano Lett.
, vol.9
, pp. 2742
-
-
Ko, D.H.1
Tumbleston, J.R.2
Zhang, L.3
Williams, S.4
Desimone, J.M.5
Lopez, R.6
Samulski, E.T.7
-
19
-
-
64349094622
-
-
10.1063/1.3117226
-
C. F. Shih, K. T. Hung, J. W. Wu, C. Y. Hsiao, and W. M. Li, Appl. Phys. Lett. 94, 143505 (2009). 10.1063/1.3117226
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 143505
-
-
Shih, C.F.1
Hung, K.T.2
Wu, J.W.3
Hsiao, C.Y.4
Li, W.M.5
-
20
-
-
1442283234
-
-
10.1016/j.tsf.2003.11.028
-
M. Niggemann, M. Glatthaar, A. Gombert, A. Hinsch, and V. Wittwer, Thin Solid Films 451-452, 619 (2004). 10.1016/j.tsf.2003.11.028
-
(2004)
Thin Solid Films
, vol.451-452
, pp. 619
-
-
Niggemann, M.1
Glatthaar, M.2
Gombert, A.3
Hinsch, A.4
Wittwer, V.5
-
21
-
-
33646596916
-
-
10.1016/j.tsf.2005.12.011
-
M. Niggemann, M. Glatthaar, P. Lewer, C. Müller, J. Wagner, and A. Gombert, Thin Solid Films 511-512, 628 (2006). 10.1016/j.tsf.2005.12.011
-
(2006)
Thin Solid Films
, vol.511-512
, pp. 628
-
-
Niggemann, M.1
Glatthaar, M.2
Lewer, P.3
Müller, C.4
Wagner, J.5
Gombert, A.6
-
22
-
-
33646552416
-
-
10.1016/j.tsf.2005.12.017
-
C. Cocoyer, L. Rocha, C. F. Debuisschert, L. Sicot, D. Vaufrey, C. Sentein, B. Geffroy, and P. Raimond, Thin Solid Films 511-512, 517 (2006). 10.1016/j.tsf.2005.12.017
-
(2006)
Thin Solid Films
, vol.511-512
, pp. 517
-
-
Cocoyer, C.1
Rocha, L.2
Debuisschert, C.F.3
Sicot, L.4
Vaufrey, D.5
Sentein, C.6
Geffroy, B.7
Raimond, P.8
-
23
-
-
76649144477
-
-
10.1016/j.orgel.2009.11.007
-
D. H. Wang, D. G. Choi, K. J. Lee, J. H. Jeong, S. H. Jeon, O. O. Park, and J. H. Park, Org. Electron. 11, 285 (2010). 10.1016/j.orgel.2009.11.007
-
(2010)
Org. Electron.
, vol.11
, pp. 285
-
-
Wang, D.H.1
Choi, D.G.2
Lee, K.J.3
Jeong, J.H.4
Jeon, S.H.5
Park, O.O.6
Park, J.H.7
-
24
-
-
33645512971
-
-
10.1063/1.2188600
-
C. Cocoyer, L. Rocha, L. Sicot, B. Geffroy, R. D. Bettignies, C. Sentein, C. F. Debuisschert, and P. Raimond, Appl. Phys. Lett. 88, 133108 (2006). 10.1063/1.2188600
-
(2006)
Appl. Phys. Lett.
, vol.88
, pp. 133108
-
-
Cocoyer, C.1
Rocha, L.2
Sicot, L.3
Geffroy, B.4
Bettignies, R.D.5
Sentein, C.6
Debuisschert, C.F.7
Raimond, P.8
-
25
-
-
37149037420
-
-
10.1063/1.2789677
-
S. B. Rim, S. Zhao, S. R. Scully, M. D. McGehee, and P. Peumans, Appl. Phys. Lett. 91, 243501 (2007). 10.1063/1.2789677
-
(2007)
Appl. Phys. Lett.
, vol.91
, pp. 243501
-
-
Rim, S.B.1
Zhao, S.2
Scully, S.R.3
McGehee, M.D.4
Peumans, P.5
-
26
-
-
78650709704
-
-
10.1002/adma.201002898
-
K. S. Nalwa, J. M. Park, K. M. Ho, and S. Chaudhary, Adv. Mater. 23, 112 (2011). 10.1002/adma.201002898
-
(2011)
Adv. Mater.
, vol.23
, pp. 112
-
-
Nalwa, K.S.1
Park, J.M.2
Ho, K.M.3
Chaudhary, S.4
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