Giant magnetoelectric coupling in laminate thin film structure grown on magnetostrictive substrate

Applied Physics Letters

Volumn 100, Issue 19, 2012, Pages

  Park, Chee Sung ^a   Khachaturyan, Armen ^b   Priya, Shashank ^a  

^a VIRGINIA POLYTECHNIC INSTITUTE AND STATE UNIVERSITY   (United States)

^b RUTGERS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DC MAGNETIC FIELD; DYNAMIC STRAIN; ELASTIC COUPLING; GIANT MAGNETOELECTRIC; HIGHLY DENSE; ME COUPLINGS; NICKEL ZINC FERRITES; PIEZOELECTRIC FILM; PZT FILM; THIN-FILM STRUCTURE;

MAGNETIC COUPLINGS; PIEZOELECTRICITY; ZINC COMPOUNDS;

MAGNETOSTRICTIVE DEVICES;

EID: 84862072405     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4712132     Document Type: Article

References (20)

1. N. A. Spaldin and M. Fiebig, Science 309, 391 (2005). 10.1126/science.1113357
2. J. Ryu, A. Vazquez Carazo, K. Uchino, and H.-E. Kim, J. Electroceram. 7, 17 (2001). 10.1023/A:1012210609895
3. C.-W. Nan, M. I. Bichurin, S. Dong, D. Viehland, and G. Srinivasan, J. Appl. Phys. 103, 301101 (2008). 10.1063/1.2836410
4. J. Ma, J. Hu, Z. Li, and C.-W. Nan, Adv. Mater. 23, 1062 (2011). 10.1002/adma.201003636
5. H. Zheng, J. Wang, S. E. Lofland, Z. Ma, L. Mohaddes-Ardabili, R. Zhao, L. Salamanca-Riba, S. R. Shinde, S. B. Ogale, F. Bai, D. Viehland, Y. Jia, D. G. Schom, M. Wuttig, A. Roytburd, and R. Ramesh, Science 303, 661 (2004). 10.1126/science.1094207
6. F. Zavaliche, H. Zheng, L. Mohaddes-Ardabili, S. Y. Yang, Q. Zhan, P. Shafer, E. Reilly, R. Chopdekar, Y. Jia, P. Wright, D. G. Schlom, Y. Suzuki, and R. Ramesh, Nano Lett. 5, 1793 (2005). 10.1021/nl051406i
7. J. G. Wan, H. Zhang, X. Wang, D. Pan, J.-M. Liu, and G. Wang, Appl. Phys. Lett. 89, 122914 (2006). 10.1063/1.2357589
8. J.-P. Zhou, H. He, Z. Shi, and C.-W. Nan, Appl. Phys. Lett. 88, 013111 (2006). 10.1063/1.2162262
9. C. W. Nan, G. Liu, Y. H. Lin, and H. D. Chen, Phys. Rev. Lett. 94, 197203 (2005). 10.1103/PhysRevLett.94.197203
10. T. Wu, M. A. Zurbuchen, S. Saha, R.-V. Wang, S. K. Streiffer, and J. F. Mitchell, Phys. Rev. B 73, 134416 (2006). 10.1103/PhysRevB.73.134416
11. C.-S. Park, J.-W. Lee, G.-T. Park, H.-E. Kim, and J.-J. Choi, J. Mater. Res. 22, 1367 (2007). 10.1557/jmr.2007.0176
12. C.-S. Park, J.-W. Lee, S.-M. Lee, S.-H. Jun, and H.-E. Kim, J. Electroceram. 25, 20 (2010). 10.1007/s10832-009-9584-9
13. G.-T. Park, J.-J. Choi, C.-S. Park, J.-W. Lee, and H.-E. Kim, Appl. Phys. Lett. 85, 2322 (2004). 10.1063/1.1794354
14. C.-S. Park and S. Priya, J. Am. Ceram. Soc. 94, 1087 (2011). 10.1111/j.1551-2916.2010.04213.x
15. S. Ito, K. Aso, Y. Makino, and S. Uedaira, Appl. Phys. Lett. 37, 665 (1980). 10.1063/1.92029
16. V. K. Vlasko-Vlasov, Y. K. Lin, D. J. Miller, U. Welp, G. W. Crabtree, and V. I. Nikitenko, Phys. Rev. Lett. 84, 2239 (2000). 10.1103/PhysRevLett.84. 2239
17. Y. K. Ferisov, V. M. Petrov, and G. Srinivasan, J. Mater. Res. 22, 2074 (2007). 10.1557/jmr.2007.0262
18. J. Wang, L. Wang, G. Liu, Z. Shen, Y. Lin, and C. W. Nan, J. Am. Ceram. Soc. 92, 2654 (2009). 10.1111/j.1551-2916.2009.03265.x
19. S. Dong, J. Zhai, J. Li, and D. Viehland, Appl. Phys. Lett. 88, 082907 (2006). 10.1063/1.2178582
20. Y. M. Jin, Yu. U. Wang, A. Kazaryan, Y. Wang, D. E. Laughlin, and A. G. Khachaturyan, J. Appl. Phys. 92, 6172 (2002). 10.1063/1.1510955