Diffusion of water molecules in amorphous silica

IEEE Electron Device Letters

Volumn 33, Issue 6, 2012, Pages 863-865

  Kostinski, Sarah ^a   Pandey, Ravindra ^b   Gowtham, S ^b   Pernisz, Udo ^c   Kostinski, Alexander ^b  

^a HARVARD UNIVERSITY   (United States)

^b MICHIGAN TECHNOLOGICAL UNIVERSITY   (United States)

^c DOW CORNING CORPORATION   (United States)

Author keywords

Amorphous silica (a SiO 2); diffusion; thin film; water vapor

Indexed keywords

AMORPHOUS SILICA; ATMOSPHERIC WATER VAPOR; CRITICAL PARAMETER; DECADAL TIMESCALE; DEVICE PERFORMANCE; DIFFUSION OF WATER; DIFFUSION TIME; ELECTRONIC DEVICE; PROTECTIVE LAYERS; TYPICAL APPLICATION; WATER DIFFUSION;

ACTIVATION ENERGY; DIFFUSION; THIN FILMS; VAPORS; WATER VAPOR;

SILICA;

EID: 84861696834     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2012.2189750     Document Type: Article

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