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Volumn 51, Issue 5 PART 2, 2012, Pages

Fabrication and characterization of planarized carbon nanotube via interconnects

Author keywords

[No Author keywords available]

Indexed keywords

CMP PROCESS; POST ANNEALING; SELECTIVE GROWTH; SPIN ON GLASS; TOP CONTACT; VIA HOLE; VIA INTERCONNECT; VIA RESISTANCE;

CARBON NANOTUBES;

CHEMICAL MECHANICAL POLISHING;

EID: 84861519586 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.51.05ED02 Document Type: Conference Paper

Times cited : (21)

References (19)

1
- 0035920684
- B. Q. Wei, R. Vajtai, and P. M. Ajayan: Appl. Phys. Lett. 79 (2001) 1172.
- (2001) Appl. Phys. Lett. , vol.79 , pp. 1172
- Wei, B.Q.¹ Vajtai, R.² Ajayan, P.M.³

2
- 4243956405
- J. Hone, M. Whitney, C. Piskoti, and A. Zettl: Phys. Rev. B 59 (1999) R2514.
- (1999) Phys. Rev. B , vol.59
- Hone, J.¹ Whitney, M.² Piskoti, C.³ Zettl, A.⁴

3
- 39249085918
- J. Kong, E. Yenilmez, T. W. Tombler, W. Kim, H. Dai, R. B. Laughlin, L. Liu, C. S. Jayanthi, and S. Y. Wu: Phys. Rev. Lett. 87 (2001) 106801.
- (2001) Phys. Rev. Lett. , vol.87 , pp. 106801
- Kong, J.¹ Yenilmez, E.² Tombler, T.W.³ Kim, W.⁴ Dai, H.⁵ Laughlin, R.B.⁶ Liu, L.⁷ Jayanthi, C.S.⁸ Wu, S.Y.⁹

4
- 1542348266
- G. S. Duesberg, A. P. Graham, F. Kreupl, M. Liebau, R. Seidel, E. Unger, and W. Hoenlein: Diamond Relat. Mater. 13 (2004) 354.
- (2004) Diamond Relat. Mater. , vol.13 , pp. 354
- Duesberg, G.S.¹ Graham, A.P.² Kreupl, F.³ Liebau, M.⁴ Seidel, R.⁵ Unger, E.⁶ Hoenlein, W.⁷

5
- 54549095817
- J. C. Coiffic, M. Fayolle, P. Faucherand, M. Levis, H. Le Poche, J. Dijon, and S. Maitrejean: Phys. Status Solidi A 205 (2008) 1399.
- (2008) Phys. Status Solidi A , vol.205 , pp. 1399
- Coiffic, J.C.¹ Fayolle, M.² Faucherand, P.³ Levis, M.⁴ Le Poche, H.⁵ Dijon, J.⁶ Maitrejean, S.⁷

6
- 78650094325
- J. H. Ting, C. C. Chiu, and F. Y. Huang: J. Vac. Sci. Technol. B 27 (2009) 1086.
- (2009) J. Vac. Sci. Technol. B , vol.27 , pp. 1086
- Ting, J.H.¹ Chiu, C.C.² Huang, F.Y.³

7
- 9144222878
- M. Horibe, M. Nihei, D. Kondo, A. Kawabata, and Y. Awano: Jpn. J. Appl. Phys. 43 (2004) 6499.
- (2004) Jpn. J. Appl. Phys. , vol.43 , pp. 6499
- Horibe, M.¹ Nihei, M.² Kondo, D.³ Kawabata, A.⁴ Awano, Y.⁵

8
- 54249164578
- D. Yokoyama, T. Iwasaki, K. Ishimaru, S. Sato, T. Hyakushima, M. Nihei, Y. Awano, and H. Kawarada: Jpn. J. Appl. Phys. 47 (2008) 1985.
- (2008) Jpn. J. Appl. Phys. , vol.47 , pp. 1985
- Yokoyama, D.¹ Iwasaki, T.² Ishimaru, K.³ Sato, S.⁴ Hyakushima, T.⁵ Nihei, M.⁶ Awano, Y.⁷ Kawarada, H.⁸

9
- 54249088937
- M. Katagiri, N. Sakuma, M. Suzuki, T. Sakai, S. Sato, T. Hyakushima, M. Nihei, and Y. Awano: Jpn. J. Appl. Phys. 47 (2008) 2024.
- (2008) Jpn. J. Appl. Phys. , vol.47 , pp. 2024
- Katagiri, M.¹ Sakuma, N.² Suzuki, M.³ Sakai, T.⁴ Sato, S.⁵ Hyakushima, T.⁶ Nihei, M.⁷ Awano, Y.⁸

10
- 70450199403
- S. Sato, A. Kawabata, T. Nozue, D. Kondo, T. Murakami, T. Hyakushima, M. Nihei, and Y. Awano: Sens. Mater. 21 (2009) 373.
- (2009) Sens. Mater. , vol.21 , pp. 373
- Sato, S.¹ Kawabata, A.² Nozue, T.³ Kondo, D.⁴ Murakami, T.⁵ Hyakushima, T.⁶ Nihei, M.⁷ Awano, Y.⁸

11
- 75149141711
- S. Lee, B. J. Lee, and P. K. Shin: Jpn. J. Appl. Phys. 48 (2009) 125006.
- (2009) Jpn. J. Appl. Phys. , vol.48 , pp. 125006
- Lee, S.¹ Lee, B.J.² Shin, P.K.³

12
- 79959968652
- M. Sato, T. Hyakushima, A. Kawabata, T. Nozue, S. Sato, M. Nihei, and Y. Awano: Jpn. J. Appl. Phys. 49 (2010) 105102.
- (2010) Jpn. J. Appl. Phys. , vol.49 , pp. 105102
- Sato, M.¹ Hyakushima, T.² Kawabata, A.³ Nozue, T.⁴ Sato, S.⁵ Nihei, M.⁶ Awano, Y.⁷

13
- 79251571257
- N. Chiodarelli, Y. Li, D. J. Cott, S. Mertens, N. Peys, M. Heyns, S. D. Gendt, G. Groeseneken, and P. M. Vereecken: Microelectron. Eng. 88 (2011) 837.
- (2011) Microelectron. Eng. , vol.88 , pp. 837
- Chiodarelli, N.¹ Li, Y.² Cott, D.J.³ Mertens, S.⁴ Peys, N.⁵ Heyns, M.⁶ Gendt, S.D.⁷ Groeseneken, G.⁸ Vereecken, P.M.⁹

14
- 79952487190
- M. Fayolle, J. Pontcharra, J. Dijon, H. Okuno, E. Quesnel, V. Muffato, C. Jayet, J. F. Lugand, P. Gautier, L. Vandroux, S. Huet, H. Grampeix, K. Yckache, D. Mariolle, and T. Billon: Microelectron. Eng. 88 (2011) 833.
- (2011) Microelectron. Eng. , vol.88 , pp. 833
- Fayolle, M.¹ Pontcharra, J.² Dijon, J.³ Okuno, H.⁴ Quesnel, E.⁵ Muffato, V.⁶ Jayet, C.⁷ Lugand, J.F.⁸ Gautier, P.⁹ Vandroux, L.¹⁰ Huet, S.¹¹ Grampeix, H.¹² Yckache, K.¹³ Mariolle, D.¹⁴ Billon, T.¹⁵

15
- 79957471567
- M. Katagiri, Y. Yamazaki, M. Wada, M. Kitamura, N. Sakuma, M. Suzuki, S. Sato, M. Nihei, A. Kajita, T. Sakai, and Y. Awano: Jpn. J. Appl. Phys. 50 (2011) 05EF01.
- (2011) Jpn. J. Appl. Phys. , vol.50
- Katagiri, M.¹ Yamazaki, Y.² Wada, M.³ Kitamura, M.⁴ Sakuma, N.⁵ Suzuki, M.⁶ Sato, S.⁷ Nihei, M.⁸ Kajita, A.⁹ Sakai, T.¹⁰ Awano, Y.¹¹

16
- 77957869748
- M. Katagiri, N. Sakuma, Y. Yamazaki, M. Suzuki, S. Sato, M. Nihei, T. Sakai, and Y. Awano: Jpn. J. Appl. Phys. 48 (2009) 090205.
- (2009) Jpn. J. Appl. Phys. , vol.48 , pp. 090205
- Katagiri, M.¹ Sakuma, N.² Yamazaki, Y.³ Suzuki, M.⁴ Sato, S.⁵ Nihei, M.⁶ Sakai, T.⁷ Awano, Y.⁸

17
- 70349441354
- Y. Yamazaki, N. Sakuma, M. Katagiri, M. Suzuki, T. Sakai, S. Sato, M. Nihei, and Y. Awano: Appl. Phys. Express 1 (2008) 034004.
- (2008) Appl. Phys. Express , vol.1 , pp. 034004
- Yamazaki, Y.¹ Sakuma, N.² Katagiri, M.³ Suzuki, M.⁴ Sakai, T.⁵ Sato, S.⁶ Nihei, M.⁷ Awano, Y.⁸

18
- 77952758637
- Y. Yamazaki, M. Katagiri, N. Sakuma, M. Suzuki, S. Sato, M. Nihei, M. Wada, N. Matsunaga, T. Sakai, and Y. Awano: Appl. Phys. Express 3 (2010) 055002.
- (2010) Appl. Phys. Express , vol.3 , pp. 055002
- Yamazaki, Y.¹ Katagiri, M.² Sakuma, N.³ Suzuki, M.⁴ Sato, S.⁵ Nihei, M.⁶ Wada, M.⁷ Matsunaga, N.⁸ Sakai, T.⁹ Awano, Y.¹⁰

19
- 19744381916
- B. Bourlon, C. Miko, L. Forro, D. C. Glattli, and A. Bachtold: Phys. Rev. Lett. 93 (2004) 176806.
- (2004) Phys. Rev. Lett. , vol.93 , pp. 176806
- Bourlon, B.¹ Miko, C.² Forro, L.³ Glattli, D.C.⁴ Bachtold, A.⁵

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