Front side plasmonic effect on thin silicon epitaxial solar cells

Solar Energy Materials and Solar Cells

Volumn 104, Issue , 2012, Pages 58-63

  El Daif, Ounsi ^a   Tong, Lianming ^b,c   Figeys, Bruno ^a   Van Nieuwenhuysen, Kris ^a   Dmitriev, Alexander ^b   Van Dorpe, Pol ^a   Gordon, Ivan ^a   Dross, Frederic ^a  

^a IMEC   (Belgium)

^b CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

^c INSTITUTE OF PHYSICS   (China)

Author keywords

Absorption; Crystalline silicon; Fano; Plasmons; Thin film solar cells

Indexed keywords

BACK REFLECTORS; COLLOIDAL LITHOGRAPHY; CRYSTALLINE SILICONS; DESTRUCTIVE INTERFERENCE; DOPED SILICON; FANO; FRONT SURFACES; LOSS MECHANISMS; MATERIAL PROPERTY; MICRON SCALE; NANODISCS; PLASMONIC; SHORT WAVELENGTHS; SILICON CELLS; THIN FILM CRYSTALLINE SILICON; THIN FILM SOLAR CELLS;

ABSORPTION; ANTIREFLECTION COATINGS; COATINGS; CRYSTALLINE MATERIALS; EPITAXIAL GROWTH; MODEL STRUCTURES; OPTICAL PROPERTIES; THIN FILMS; VAPOR DEPOSITION;

PLASMONS;

EID: 84861331991     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2012.05.009     Document Type: Article

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