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Journal of Materials Chemistry

Volumn 22, Issue 22, 2012, Pages 11054-11061

Graphene oxide reduction by standard industrial reducing agent: Thiourea dioxide

(3) Chua, Chun Kiang a Ambrosi, Adriano a Pumera, Martin a

a Nanyang Technological University (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ASCORBIC ACIDS; ATR FTIR; ATTENUATED TOTAL REFLECTANCE FOURIER TRANSFORM INFRARED SPECTROSCOPY; BULK PRODUCTION; CHARGE TRANSFER RESISTANCE; CHEMICAL REDUCTION; CURRENT FABRICATION; EIS MEASUREMENTS; ELECTROCHEMICAL PERFORMANCE; GRAPHENE OXIDES; INDUSTRIAL SCALE; MICROSCOPY TECHNIQUE; OVERPOTENTIAL; REDUCED GRAPHENE OXIDES; REDUCTANTS; STANDARD PROTOCOLS; THIOUREA DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY TEM; XPS ANALYSIS;

CHARGE TRANSFER; CYCLIC VOLTAMMETRY; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAPHENE; INDUSTRY; KETONES; ORGANIC ACIDS; PHOTOELECTRONS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; THIOUREAS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

REDUCTION;

EID: 84861306932 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/c2jm16054d Document Type: Article

Times cited : (138)

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