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Materials Science and Engineering: B

Volumn 177, Issue 10, 2012, Pages 725-728

Silicon-rich oxynitride hosts for 1.5 μm Er3+ emission fabricated by reactive and standard RF magnetron sputtering

(8) Cueff, S a Labbe C a Khomenkova, L a Jambois, O b Pellegrino, P b Garrido, B b Frilay, C a Rizk, R a

a UNIVERSITÉ DE CAEN (France)

b UNIVERSITY OF BARCELONA (Spain)

Author keywords

Erbium; Oxynitrides; Photoluminescence; Silicon; Sputtering

Indexed keywords

ERBIUM COMPOUNDS; FABRICATION; MAGNETRON SPUTTERING; SILICON NITRIDE; SILICON OXIDES;

1.5 ΜM; ER-DOPED; ERBIUM EMISSION; MATRIX; OXYNITRIDES; PL INTENSITY; R.F. MAGNETRON SPUTTERING; SILICON RICH; SILICONOXYNITRIDE; SPUTTERING;

SILICA;

EID: 84861235527 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/j.mseb.2011.12.007 Document Type: Article

Times cited : (16)

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