Simulation of interaction between two counter-propagating streamers

Plasma Sources Science and Technology

Volumn 21, Issue 3, 2012, Pages

  Naidis, G V ^a  

^a JOINT INSTITUTE FOR HIGH TEMPERATURES   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

COUNTERPROPAGATING; PLASMA PARAMETER; SPATIAL PROFILES;

CONDENSED MATTER PHYSICS; PLASMA SOURCES;

HELIUM;

EID: 84861128908     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/21/3/034003     Document Type: Article

References (20)

1. Teschke M, Kedzierski J, Finantu-Dinu E G, Korzec D and Engemann J 2005 IEEE Trans. Plasma Sci. 33 310
2. Lu X and Laroussi M 2006 J. Appl. Phys. 100 063302
3. Sands B L, Ganguly B N and Tachibana K 2008 Appl. Phys. Lett. 92 151503
4. Urabe K, Morita T, Tachibana K and Ganguly B N 2010 J. Phys. D: Appl. Phys. 43 095201
5. Karakas E, Koklu M and Laroussi M 2010 J. Phys. D: Appl. Phys. 43 155202
6. Walsh J L, Iza F, Janson N B, Law V J and Kong M G 2010 J. Phys. D: Appl. Phys. 43 075201
7. Naidis G V 2011 J. Phys. D: Appl. Phys. 44 215203
8. Naidis G V 2011 Appl. Phys. Lett. 98 141501
9. Breden D, Miki K and Raja L L 2011 Appl. Phys. Lett. 99 111501
10. Jansky J and Bourdon A 2011 Appl. Phys. Lett. 99 161504
11. Sretenovi G B, Krsti I B, Kovaevi V V, Obradovi B M and Kuraica M M 2011 Appl. Phys. Lett. 99 161502
12. Begum A, Laroussi M and Pervez M R 2011 Int. J. Eng. Technol. 11 209
13. Douat C, Fleury M, Laroussi M and Puech V 2011 IEEE Trans. Plasma Sci. 39 2298
14. Morrow R and Lowke J J 1997 J. Phys. D: Appl. Phys. 30 614
15. Aleksandrov N L and Bazelyan E M 1996 J. Phys. D: Appl. Phys. 29 740
16. Eichwald O, Ducasse O, Merbahi N, Yousfi M and Dubois D 2006 J. Phys. D: Appl. Phys. 39 99
17. Babaeva N Yu and Naidis G V 1996 J. Phys. D: Appl. Phys. 29 2423
18. Naidis G V 2009 Phys. Rev. E 79 057401
19. Davies A J and Evans C J 1967 Proc. IEE 114 1547
20. Dutton J 1975 J. Phys. Chem. Ref. Data 4 577