High-resolution lightfield photography using two masks

Optics Express

Volumn 20, Issue 10, 2012, Pages 10971-10983

  Xu, Zhimin ^a   Ke, Jun ^a   Lam, Edmund Y ^a  

^a UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

COLOR PHOTOGRAPHY;

AFTER-IMAGES; CAMERA SENSOR; COMPUTATIONAL PHOTOGRAPHY; DATA SETS; HIGH RESOLUTION; HIGHER RESOLUTION; IMAGING CAPABILITIES; NEW DESIGN; OPTICAL PATH; POST PROCESSING; SPATIAL RESOLUTION;

SENSORS;

ALGORITHM; ARTICLE; EQUIPMENT DESIGN; FOURIER ANALYSIS; IMAGE ENHANCEMENT; IMAGE PROCESSING; LIGHT; METHODOLOGY; OPTICS; PHOTOGRAPHY; STATISTICAL MODEL; THREE DIMENSIONAL IMAGING;

ALGORITHMS; EQUIPMENT DESIGN; FOURIER ANALYSIS; IMAGE ENHANCEMENT; IMAGE PROCESSING, COMPUTER-ASSISTED; IMAGING, THREE-DIMENSIONAL; LIGHT; MODELS, STATISTICAL; OPTICS AND PHOTONICS; PHOTOGRAPHY;

EID: 84861120126     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.20.010971     Document Type: Article

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