Quantitative analysis of diamond deposition reactor efficiency

Chemical Physics

Volumn 398, Issue 1, 2012, Pages 239-247

  Gicquel, A ^a,b   Derkaoui, N ^a,b   Rond, C ^a,b   Benedic, F ^a,b   Cicala, G ^c   Moneger, D ^a,b   Hassouni, K ^a,b  

^a UNIVERSITÉ PARIS 13   (France)

^b Laboratoire d'Excellence Sciences and Engineering for Advanced Materials and Devices   (France)

^c CNR Consiglio Nazionale delle Ricerche   (Italy)

Author keywords

Actinometry; Diamond deposition; Emission spectroscopy; Microwave plasma; Plasma modelling

Indexed keywords

EID: 84860881018     PISSN: 03010104     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.chemphys.2011.08.022     Document Type: Article

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