Characterization of Semiconductor Nanostructures by Scanning Electron Microscopy

Handbook Of Instrumentation And Techniques For Semiconductor Nanostructure Characterization (In 2 Volumes)

Volumn , Issue , 2011, Pages 1-42

  Gignac, Lynne M ^a   Wells, Oliver C ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84860829265     PISSN: None     EISSN: None     Source Type: Book    
DOI: None     Document Type: Chapter

References (47)

1. O. C. Wells, Scanning Electron Microscopy, McGraw-Hill, New York (1974).
2. L. Reimer, Scanning Electron Microscopy: Physics of Image Formation and Microanalysis, 2nd ed., Springer-Verlag, Berlin (1998).
3. J. Goldstein, D. Newbury, D. Joy, C. Lyman, P. Echlin, E. Lifschin, L. Sawyer, J. Michael, Scanning Electron Microscopy and X-ray Microanalysis, 3rd ed., Springer Science + Business Media, Inc., New York (2003).
4. W. Zhou, Z. L. Wang, Scanning Microscopy for Nanotechnology: Techniques and Applications, (eds.), Springer Science + Business Media, LLC, New York (2007).
5. D. C. Joy, J. B. Pawley, Ultramicroscopy 47, 80 (1992).
6. J. B. Pawley, Advances in Electronics & Electron Phys. 83, 203 (1992).
7. J. Pawley, Scanning 19, 324 (1997).
8. H. Koike, K. Ueno, M. Suzuki, T. Matsuo, S. Aita, K. Shibatomi, JEOL News 9e, 20 (1971).
9. J. Ohyama, A. Ono, Y. Harada, S. Gotoh, Proc. Xlth Int. Congress Electr. Microsc. (ICEM) 373 (1986).
10. T. Nagatani, S. Saito, M. Sato, M. Yamada, Scan. Micros. 1, 901 (1987).
11. D. M. Follstaedt, J. A. van den Avyle, A. D. Romig, J. A. Knapp, Proc. Mater. Res. Soc. (MRS) Symp. 225, 223 (1991).
12. J. C. Doan, S. Lee, S.-H. Lee, N. E. Meier, J. C. Bravman, P. A. Flinn, T. N. Marieb, M. C. Madden, Rev. Sci. Instrum. 71, 2848 (2000).
13. L. M. Gignac, M. Kawasaki, S. H. Boettcher, O. C. Wells, J. Appl. Phys. 97, 114506-1 (2005).
14. L. M. Gignac, M. Kawasaki, S. H. Boettcher, O. C. Wells, JEOL News 40, 13 (2005).
15. L. M. Gignac, O. C. Wells, C.-K. Hu, J. Bruley, C. E. Murray, A. Frye, Microsc. Microanal. 14, 120 (2008).
16. L. M. Gignac, S. H. Boettcher, A. A. Bol, O. C. Wells, M. Kawasaki, Microsc. Microanal. 12, 1444 (2006).
17. Y. Zhu, H. Inada, K. Nakamura, J. Wall, Nature Mat. 8, 808 (2009).
18. T. Mulvey, C. D. Newman, Inst. Phys. London Conf. Ser, Scan. Electr. Microsc.: Systems and Appl. 1, 16 (1973).
19. T. Mulvey, Scan. Electr. Microsc. (Part I) 1, 43, 190 (1974).
20. M. Sato, H. Todokoro, K. Kageyama, Proc. SPIE: Charged-particle Optics 2014, 17 (1993).
21. Y. Yamamoto, M. Yamada, T. Negishi, Scanning 19, 505 (1997).
22. M. Sato, R. Tamochi, T. Suzuki, M. Goto, Hitchi Review 43, 191 (1994).
23. B. Tracy, Proc. Mat. Res. Soc.: Electr. Microsc. of Semicond. Mat. and ULSI Dev. 523, 177 (1998).
24. J. Frosien, E. Plies, K. Anger, J. Vac. Sci. Tech. B 7, 1874 (1989).
25. H. Jaksch, J. P. Martin, Fresenius J. Anal. Chem. 353, 378 (1995).
26. L. Reimer, Image Formation in Low-Voltage Scanning Electron Microscopy, SPIE Optical Engineering Press, Bellingham, WA (1993).
27. D. C. Joy, C. S. Joy, Micron 27, 247 (1996).
28. I. Miillerova, L. Frank, Adv. Imag. and Electr. Phys. 128, 309 (2003).
29. D. J. Fathers, D. C. Joy, J. P. Jakubovics, Proc. 8th Int. Cong, on Electr. Microsc. (ICEM) 630 (1974).
30. T. E. Everhart, R. F. M. Thornley, J. Sci. Instr. 37, 246 (1960).
31. C. W. Oatley, W. C. Nixon, R. F. W. Pease, Advan. in Electronics & Electron Phys. 21, 181 (1965).
32. I. Miillerova, L. Frank, Scanning 15, 193 (1993).
33. D. Phifer, L. Tuma, T. Vystavel, P. Wandrol, R. J. Young, Microscopy Today 17, 40 (2009).
34. J. Zach, Opik 83, 30 (1989).
35. J. Zach, M. Haider, Nuc. Instr. Meth. in Phys. Res. A 363, 316 (1995).
36. K. Honda, S. Takashima, JEOL News 38, 36 (2003).
37. T. Kawasaki, T. Nakano, K. Hirose, Microelectr. Eng. 86, 1017 (2009).
38. D. C. Joy, "The Aberration-Corrected SEM,” in Biological Low-Voltage Scanning Electron Microscopy, eds. H. Schatten, J. B. Pawley (Springer Science + Business Media, LLC, New York, 2008).
39. R. Young, S. Henstra, J. Chmelik, T. Dingle, A. Mangnus, G. van Veen, I. Gestmann, Proc. SPIE: Scanning Microscopy 7378, 737803-1 (2009).
40. K. Nikawa, K. Nasu, M. Murase, T. Kaito, T. Adachi, S. Inoue, Proc. 27th Int. Reliability Phys. Symp. 43 (1989).
41. J. Orloff, Rev. Sci. Instr. 64, 1105 (1993).
42. J. Orloff, L. Swanson, M. Utlaut, High Resolution Focused Ion Beams: FIB and Applications, Springer, New York, NY (2002).
43. L. A. Giannuzzi, F. A. Stevie, Introduction to Focused Ion Beams: Instrumentation, Theory, Techniques and Practice, Springer Science + Business Media, Inc., New York, NY (2005).
44. B. Van Leer, L. A. Giannuzzi, P. Anzalone, Applications of FIB and DualBeam for Nanofabrication,” in Scanning Microscopy for Nanotechnology: Techniques and Applications, eds. W. Zhou, Z. L. Wang (Springer Science + Business Media, LLC, New York, 2007).
45. L. A. Giannuzzi, J. L. Drown, S. R. Brown, R. B. Irwin, F. A. Stevie, Proc. Mater. Res. Soc. (MRS) 480, 19 (1997).
46. L. A. Giannuzzi, J. L. Drown, S. R. Brown, R. B. Irwin, F. A. Stevie, Microscopy Res. & Technique 41, 285 (1998).
47. J. Liu, J. M. Cowley, Scan. Microsc. 2, 1957 (1988).