Fabrication of crystalline semiconductor nanowires by vapor-liquid-solid glancing angle deposition (VLS-GLAD) technique

Materials Research Society Symposium Proceedings

Volumn 1350, Issue , 2011, Pages 30-35

  Alagoz, Arif S ^a   Karabacak, Tansel ^a  

^a University of Arkansas at Little Rock ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH FROM VAPOR; CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; FABRICATION; GEOMETRY; LIQUIDS; MECHANICAL PROPERTIES; NANOWIRES; PHYSICAL VAPOR DEPOSITION; SEMICONDUCTOR GROWTH; SEMICONDUCTOR MATERIALS; SINGLE CRYSTALS; THERMAL EVAPORATION;

CRYSTALLINE NANOWIRES; CRYSTALLINE SEMICONDUCTORS; GLANCING ANGLE DEPOSITION; SELECTIVE DEPOSITION; SINGLE CRYSTAL NANOWIRES; SINGLE-CRYSTAL GERMANIUM; THERMAL EVAPORATION SYSTEMS; VAPOR LIQUID SOLID METHODS;

NANOCATALYSTS;

EID: 84860625186     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/opl.2011.1005     Document Type: Conference Paper

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