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Supplementary material at E-APPLAB-100-077210 for fabrication process and experimental setup; amplitude of the response pulses in the unstable regime; electrothermal simulation of 2- and 3-SNAPs in the unstable regime; dependency of the avalanche current on the number of sections and r; discussion on the afterpulsing of sub-1-ns-reset-time devices; and Low-reset-time SNAPs.
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See supplementary material at http://dx.doi.org/10.1063/1.3691944 E-APPLAB-100-077210 for fabrication process and experimental setup; amplitude of the response pulses in the unstable regime; electrothermal simulation of 2- and 3-SNAPs in the unstable regime; dependency of the avalanche current on the number of sections and r; discussion on the afterpulsing of sub-1-ns-reset-time devices; and Low-reset-time SNAPs.
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